Summary

International Symposium on Electromagnetic Compatibility

2009

Session Number:21R1

Session:

Number:21R1-2

Optically Scanning Probe System for Electromagnetic Near Field Measurements

M. Takahashi,  

pp.45-48

Publication Date:2009/7/20

Online ISSN:2188-5079

DOI:10.34385/proc.14.21R1-2

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Summary:
An optically scanning electromagnetic field probe system, consisting of an electro-optic or magneto-optic crystal substrate and a galvano scanner, has been developed for the high speed, low-invasive measurement of electromagnetic near field distribution. We present some examples of electric field distribution measurements using a LiNbO3 crystal substrate and the probe system. We have also measured magnetic field distributions above an MSL using a magnetic garnet thin film in the gigahertz range.