Electronics-Silicon Devices and Materials(Date:1999/11/19)

Presentation
表紙

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[Date]1999/11/19
[Paper #]
目次

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[Date]1999/11/19
[Paper #]
Development of Electron Beam Mask Writing System EX-11 for 0.18um devices and beyond. : Drawing Accuracy Evaluation of Electron Beam Mask Writing System EX-11

Satoshi Yamasaki,  Noriaki Nakayamada,  Kazuto Matsuki,  Tomohiro Iijima,  Souji Koikari,  kiminobu Akeno,  Ryoichi Hirano,  

[Date]1999/11/19
[Paper #]SDM99-156
The study on automatic measurement method of lens aberration

Katsuya Hayano,  Norio Hasegawa,  Masami Ikota,  Naoko Asai,  Akira Imai,  

[Date]1999/11/19
[Paper #]SDM99-157
Inspection results of ARC and organic materials by spectroscopic ellipsometry for photolithography applications.

P. BOHER,  J. P. PIEL,  J. L. STEHLE,  Y. SUZUKI,  

[Date]1999/11/19
[Paper #]SDM99-158
Development of attenuated phase-shift mask in ArF lithography

Keisuke Nakazawa,  Takahiro Matsuo,  Toshio Onodera,  Junji Miyazaki,  Takashi Okagawa,  Tohru Ogawa,  Hiroaki Morimoto,  

[Date]1999/11/19
[Paper #]SDM99-159
Electron beam lithography for MOSFET device fabrication

Kotaro Kataoka,  Ikuo Fujiwara,  Shigeki Hayashida,  Takayuki Ogura,  Masato Umetani,  Akira Tanabe,  Hiroshi Sakuraba,  Tetsuo Endoh,  Fujio Masuoka,  

[Date]1999/11/19
[Paper #]SDM99-160
The gate shrinkage method by double exposure phase shift mask

Hidetoshi Ohnuma,  Kohji Kikuchi,  Mizuho Higashi,  Hiroichi Kawahira,  

[Date]1999/11/19
[Paper #]SDM99-161
1transistor/1capacitor, GAIN cell type Chain FRAM

S. Watanabe,  D. Takashima,  S. Shuto,  I. Kunishima,  H. Takenaka,  Y. Oowaki,  S. Tanaka,  

[Date]1999/11/19
[Paper #]SDM99-162
[OTHERS]

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[Date]1999/11/19
[Paper #]