| Presentation | 1999/11/19 Inspection results of ARC and organic materials by spectroscopic ellipsometry for photolithography applications. P. BOHER, J. P. PIEL, J. L. STEHLE, Y. SUZUKI, |
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| PDF Download Page | PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | spectroscopic ellipsometry / ARC / photoresist |
| Paper # | SDM99-158 |
| Date of Issue |
| Conference Information | |
| Committee | SDM |
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| Conference Date | 1999/11/19(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
| Chair | |
| Vice Chair | |
| Secretary | |
| Assistant | |
| Paper Information | |
| Registration To | Silicon Device and Materials (SDM) |
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| Language | ENG |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Inspection results of ARC and organic materials by spectroscopic ellipsometry for photolithography applications. |
| Sub Title (in English) | |
| Keyword(1) | spectroscopic ellipsometry |
| Keyword(2) | ARC |
| Keyword(3) | photoresist |
| 1st Author's Name | P. BOHER |
| 1st Author's Affiliation | SOPRA S.A.() |
| 2nd Author's Name | J. P. PIEL |
| 2nd Author's Affiliation | SOPRA S.A. |
| 3rd Author's Name | J. L. STEHLE |
| 3rd Author's Affiliation | SOPRA S.A. |
| 4th Author's Name | Y. SUZUKI |
| 4th Author's Affiliation | SEIKA Corp. Bldg. |
| Date | 1999/11/19 |
| Paper # | SDM99-158 |
| Volume (vol) | vol.99 |
| Number (no) | 457 |
| Page | pp.pp.- |
| #Pages | 10 |
| Date of Issue | |