Summary
Optoelectronics and Communications Conference/International Conference on Integrated Optics and Optical Fiber Communication
2007
Session Number:11P
Session:
Number:11P-27
Etching Characteristics of Low-k Polymer for Wide Modulation Bandwidth VCSELs
Akihiro Matsutani, Naoki Jogan, Fumio Koyama, Kohroh Kobayashi,
pp.274-275
Publication Date:2007/7/9
Online ISSN:2188-5079
Summary:
We investigated etching characteristics of low-k polymer for wide modulation bandwidth VCSELs. We used an O 2-plasma etching process for patterning a low-k polymer passivation film. The parasitic capacitance of VCSELs could be reduced by using the low-k polymer.