Electronics-Silicon Devices and Materials(Date:2023/10/13)

Presentation
[Invited Talk (Young Researcher)] Investigation on Thermoelectric Properties of Flexible Thermoelectric Power Generators from Conductive Fabrics

Hudzaifah Al Hijri(Shizuoka Univ.),  Daiki Kansaku(Shizuoka Univ.),  Hiroya Ikeda(Shizuoka Univ.),  

[Date]2023-10-13
[Paper #]SDM2023-55
Formation process of GaN MOS interface suppressing interfacial oxidation

Tsurugi Kondo(Fuji Electric),  Katsunori Ueno(Fuji Electric),  Ryo Tanaka(Fuji Electric),  Shinya Takashima(Fuji Electric),  Masaharu Edo(Fuji Electric),  Tomoyuki Suwa(NICHe, Tohoku Univ.),  

[Date]2023-10-13
[Paper #]SDM2023-60
Excimer laser annealing method with the controlled grain size of poly-Si films and TFT characteristics

Shu Nishida(Kyushu Univ.),  Keita Katayama(Kyushu Univ.),  Daisuke Nakamura(Kyushu Univ.),  Tetsuya Goto(Tohoku Univ.),  Hiroshi Ikenoue(Kochi Univ. of Technology),  

[Date]2023-10-13
[Paper #]SDM2023-58
Formation and basic evaluation of gallium oxide thin film on sapphire substrate

Fuminobu Imaizumi(NIT, Oyama college),  Takumi Morita(NIT, Oyama college),  

[Date]2023-10-13
[Paper #]SDM2023-59
[Invited Talk] Determination of charge centroid location and energy depth of charge carriers trapped in silicon nitride charge-trap layers

Kiyoteru Kobayashi(Tokai Univ.),  

[Date]2023-10-13
[Paper #]SDM2023-56
A study on the integration process of ReRAM and OFET utilizing Nitrogen doped LaB6/LaBxNy stacked structure

Jiaang Zhao(Tokyo Tech),  Shun-ichiro Ohmi(Tokyo Tech),  

[Date]2023-10-13
[Paper #]SDM2023-61
[Invited Talk] statistical analysis of random telegraphic noise dependence on operating condition using electrical characteristic measurement platform

Takezo Mawaki(Tohoku Univ.),  Rihito Kuroda(Tohoku Univ.),  

[Date]2023-10-13
[Paper #]SDM2023-57
[Invited Talk] Defect Reduction in UV Nanoimprint Lithography

Toshiki ITO(Canon),  

[Date]2023-10-13
[Paper #]SDM2023-54