Electronics-Silicon Devices and Materials(Date:2003/06/20)

Presentation
表紙

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[Date]2003/6/20
[Paper #]
目次

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[Date]2003/6/20
[Paper #]
Boron, Phsphorus, Arsenic and Antimony Diffusion in Silicon Dioxide : Annealing Ambience Dependence

Takayuki AOYAMA,  Kunihiro SUZUKI,  Hiroko TASHIRO,  

[Date]2003/6/20
[Paper #]SDM2003-62
First-principle calculation of B diffusion in SiO_2

Minoru Otani,  Kenji Shiraishi,  Atsushi Oshiyama,  

[Date]2003/6/20
[Paper #]SDM2003-63
Electronic Structure Analysis by Photoelectron Spectroscopy Using High-Brilliant Synchrotron Radiation

Yasutaka TAKATA,  

[Date]2003/6/20
[Paper #]SDM2003-64
Analysis of SiO_2/Si(001) Interface by High-resolution RBS/channeling

Kaoru NAKAJIMA,  Yoshihiko HANO,  Motofumi SUZUKI,  Kenji KIMURA,  

[Date]2003/6/20
[Paper #]SDM2003-65
Chemical Structures near The Rare Earth Oxide Film/Si(100) Interface

Hiroshi NOHlRA,  Takayoshi SHIRAISHI,  Kensuke TAKAHASHl,  Ikumi KASHIWAGI,  Chiduru OHSHlMA,  Shun-ichiro OHMI,  Hiroshi IWAI,  Shinji JYOMORI,  Kaoru NAKAJIMA,  Motofumi SUZUKI,  Kenji KIMURA,  Takeo HATTORI,  

[Date]2003/6/20
[Paper #]SDM2003-66
High Resolution Angle-Resolved Photoelectron Spectroscopy of Si Oxynitride and High-k Films/Si Interfaces

Masaharu OSHIMA,  Satoshi TOYODA,  Tsutomu OKUMURA,  Jun OKABAYASHI,  Hiroshi KUMIGASHIRA,  Kanta ONO,  Norio HIRASHITA,  Masaaki NIWA,  Koji USUDA,  

[Date]2003/6/20
[Paper #]SDM2003-67
Mesoscopic-range strain field under SiO_2/Si interface by using phase sensitive X-ray diffraction technique

Wataru Yashiro,  Kazushi Miki,  Kazushi Sumitani,  Yoshitaka Yoda,  Toshio Takahashi,  Kensuke Takahashi,  Takeo Hattori,  

[Date]2003/6/20
[Paper #]SDM2003-68
ESR observation of interface defects between Si and gate insulator as well as of film defects in gate insulators

Satoshi YAMASAKI,  Wataru FUTAKO,  Norikazu MIZUOCHI,  

[Date]2003/6/20
[Paper #]SDM2003-69
Characterization of Annealing Temperature Dependence of Y_2O_3 and YAlO_x thin Films

Yukiko IZUMI,  Takashi YAMAMOTO,  Hideki HASHIMOTO,  Ichizou KOBAYASHI,  Masanori OHSAWA,  Yoshihiro SUGITA,  

[Date]2003/6/20
[Paper #]SDM2003-70
XAFS Study of HfSiO_x thin films

Yasushi UEHARA,  Kazumasa KAWASE,  Junichi TSUCHIMOTO,  Teruo SHIBANO,  

[Date]2003/6/20
[Paper #]SDM2003-71
Reflection Electron Energy Loss Spectroscopy of HfSiO_x films

Yuuichi KAMIMUTA,  Masamichi SUZUKI,  Tsunehiro INO,  Masahiro KOIKE,  Akira NISHIYAMA,  

[Date]2003/6/20
[Paper #]SDM2003-72
Electrical properties and characterization of HfAlO_x films prepared by LL-D&A process

T Nabatame,  K Iwamoto,  K Tominaga,  T Yasuda,  H Ota,  H Hisamatsu,  N Yasuda,  W Mizubayashi,  T Horikawa,  A Toriumi,  

[Date]2003/6/20
[Paper #]SDM2003-73
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[Date]2003/6/20
[Paper #]
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[Date]2003/6/20
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