| Presentation | 2003/6/20 XAFS Study of HfSiO_x thin films Yasushi UEHARA, Kazumasa KAWASE, Junichi TSUCHIMOTO, Teruo SHIBANO, |
|---|---|
| PDF Download Page | PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | XAFS study was applied to investigate the local structure around hafnium atoms in Hf(Si)O_x thin films. The electron conversion method has revealed to be effective for the measurements of less than 10 nm thick films. We have found that the amount of the first nearest neighbors around Hf atoms are almost the same among HfO_2 powder and thin films, while the signal from the second nearest neighbor atoms of Hf becomes weak for the HfO_x thin films, and it disappears when silicon atoms are added to the film, which implies that the Si added film has neither HfO_2 cluster nor HfSiO_4 cluster. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | High-k gate dielectrics / gate dielectrics / HfO_2 / HfSiO_x / amorphous / XAFS / SPring-8 / coordination number |
| Paper # | SDM2003-71 |
| Date of Issue |
| Conference Information | |
| Committee | SDM |
|---|---|
| Conference Date | 2003/6/20(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
| Chair | |
| Vice Chair | |
| Secretary | |
| Assistant | |
| Paper Information | |
| Registration To | Silicon Device and Materials (SDM) |
|---|---|
| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | XAFS Study of HfSiO_x thin films |
| Sub Title (in English) | |
| Keyword(1) | High-k gate dielectrics |
| Keyword(2) | gate dielectrics |
| Keyword(3) | HfO_2 |
| Keyword(4) | HfSiO_x |
| Keyword(5) | amorphous |
| Keyword(6) | XAFS |
| Keyword(7) | SPring-8 |
| Keyword(8) | coordination number |
| 1st Author's Name | Yasushi UEHARA |
| 1st Author's Affiliation | Advanced Technology R&D Center, Mitsubishi Electric Co.() |
| 2nd Author's Name | Kazumasa KAWASE |
| 2nd Author's Affiliation | Advanced Technology R&D Center, Mitsubishi Electric Co. |
| 3rd Author's Name | Junichi TSUCHIMOTO |
| 3rd Author's Affiliation | Process Development Division, Renascence Technology Co. |
| 4th Author's Name | Teruo SHIBANO |
| 4th Author's Affiliation | Advanced Technology R&D Center, Mitsubishi Electric Co. |
| Date | 2003/6/20 |
| Paper # | SDM2003-71 |
| Volume (vol) | vol.103 |
| Number (no) | 149 |
| Page | pp.pp.- |
| #Pages | 5 |
| Date of Issue | |