| Presentation | 2003/6/20 Reflection Electron Energy Loss Spectroscopy of HfSiO_x films Yuuichi KAMIMUTA, Masamichi SUZUKI, Tsunehiro INO, Masahiro KOIKE, Akira NISHIYAMA, |
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| PDF Download Page | PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | HfO_2 and HfSiO_x are attractive materials for the alternative gate dielectrics. Therefore it is important to measure their band gap in order to understand these electrical properties. We have used Reflection Electron Energy Loss Spectroscopy (REELS) to estimate the energy band gaps of these films. It is confirmed that REELS is a powerful tool to estimate the energy band gaps of high-k thin films because of its high surface sensitivity. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | High-k / gate dielectric / HfSiO_x / Reflection Electron Energy Loss Spectroscopy / band gap |
| Paper # | SDM2003-72 |
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| Conference Information | |
| Committee | SDM |
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| Conference Date | 2003/6/20(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
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| Paper Information | |
| Registration To | Silicon Device and Materials (SDM) |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Reflection Electron Energy Loss Spectroscopy of HfSiO_x films |
| Sub Title (in English) | |
| Keyword(1) | High-k |
| Keyword(2) | gate dielectric |
| Keyword(3) | HfSiO_x |
| Keyword(4) | Reflection Electron Energy Loss Spectroscopy |
| Keyword(5) | band gap |
| 1st Author's Name | Yuuichi KAMIMUTA |
| 1st Author's Affiliation | Corporate Research And Development Center 8() |
| 2nd Author's Name | Masamichi SUZUKI |
| 2nd Author's Affiliation | Corporate Research And Development Center 1 |
| 3rd Author's Name | Tsunehiro INO |
| 3rd Author's Affiliation | Corporate Research And Development Center 1 |
| 4th Author's Name | Masahiro KOIKE |
| 4th Author's Affiliation | Corporate Research And Development Center 1 |
| 5th Author's Name | Akira NISHIYAMA |
| 5th Author's Affiliation | Corporate Research And Development Center 8 |
| Date | 2003/6/20 |
| Paper # | SDM2003-72 |
| Volume (vol) | vol.103 |
| Number (no) | 149 |
| Page | pp.pp.- |
| #Pages | 6 |
| Date of Issue | |