Electronics-Component Parts and Materials(Date:2010/10/21)

Presentation
表紙

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[Date]2010/10/21
[Paper #]
目次

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[Date]2010/10/21
[Paper #]
Characteristic of Potassium niobate/Barium titanate composites

Ryosuke USUI,  Noriko BAMBA,  

[Date]2010/10/21
[Paper #]CPM2010-91
Growth of potassium tantalate single crystal by the directional solidification method

Takayuki TAKENAKA,  Noriko BANBA,  Keigo HOSHIKAWA,  

[Date]2010/10/21
[Paper #]CPM2010-92
Structure and magnetic properties of SBA-15 with magnetic metal

Yoshihiro SHINOHARA,  Tetsuji HAEIWA,  

[Date]2010/10/21
[Paper #]CPM2010-93
Magnetic properties of TbFeCo films with Au underlayer for perpendicular magnetic recording

Songtian LI,  Xiaoxi LIU,  Akimitsu MORISAKO,  

[Date]2010/10/21
[Paper #]CPM2010-94
Preparation of ZnO Nanowires by Ultrasonic Spray Pyrolysis : Effect of Solvent on Crystal Morphology

Myo Than Htay,  Hiroshi YASUMATSU,  Takanori TANAKA,  Yoshio HASHIMOTO,  

[Date]2010/10/21
[Paper #]CPM2010-95
Structure and electric properties of RF-sputtered p-type nickel oxide thin films

Atsushi Nagata,  Kazuo Uchida,  Atsushi Koizumi,  Hiroshi Ono,  Shinji Nozaki,  

[Date]2010/10/21
[Paper #]CPM2010-96
Formation of SrAl_2O_4:Eu, Dy thin films by combined the Unbalanced Magnetron Sputtering and the Facing Target Sputtering Method

Takashi KUNO,  Minoru SAITO,  Kazuaki KOBAYASHI,  Hidehiko SHIMIZU,  Haruo IWANO,  Takahiro KAWAKAMI,  Yasuo FUKUSHIMA,  Kotaro NAGATA,  

[Date]2010/10/21
[Paper #]CPM2010-97
MCR-CVD法によるフッ素フリータングステン成長(薄膜プロセス・材料,一般)

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[Date]2010/10/21
[Paper #]CPM2010-98
Low temperature growth of SiC films by HW-CVD using graphite filaments

Yuya SAKAGUCHI,  Hironori NAKAMURA,  Jun ARIMA,  Kazuhisa MORIYAMA,  Rinpei HAYASHIBE,  Katsuya ABE,  

[Date]2010/10/21
[Paper #]CPM2010-99
Estimation of nitride layer thickness and characterization of the interface between SiC and nitride layer prepared by direct nitridation

Shin-ichiro SUZUKI,  Yusuke MURATA,  Mitsunori HENMI,  Tomohiko YAMAKAMI,  Rinpei HAYASHIBE,  Kiichi KAMIMURA,  

[Date]2010/10/21
[Paper #]CPM2010-100
Estimation of interface state density at nitride/SiC interface using current-voltage characteristics of MIS Schottky contact

Yusuke MURATA,  Shinitiro SUZUKI,  Shohei KOBAYASHI,  Tomohiko YAMAGAMI,  Rinpei HAYASHIBE,  Kichi KAMIMURA,  

[Date]2010/10/21
[Paper #]CPM2010-101
Optimization of GaN film growth condition using pulse-mode hot-mesh CVD

Kazuki NAGATA,  Souichi SATOMOTO,  Hironori KATAGIRI,  Kazuo JINBO,  Maki SUEMITSU,  Tetuo Endoh,  Takashi ITOU,  Hideki NAKAZAWA,  Yuzuru NARITA,  Kanji YASUI,  

[Date]2010/10/21
[Paper #]CPM2010-102
Preparation of Cu_2ZnSnS_4 Thin Film for solar cell : Effect of Precursors and Sulfurization conditions

Myo Than Htay,  Yasuyoshi KANDO,  Yoshio HASHIMOTO,  

[Date]2010/10/21
[Paper #]CPM2010-103
Examination of the Mg-Cu Thin Films by Alternate layer Deposition

Takeru SHIMIZU,  Toshiro TANNAI,  Hiroaki MATSUI,  Hidehiko SHIMIZU,  Haruo IWANO,  Takahiro KAWAKAMI,  

[Date]2010/10/21
[Paper #]CPM2010-104
Examination of ITO Thin Films Deposited at Low-temperature for OLEDs by Sputtering Method

Yohei NAKAMURA,  Chag LIU,  Hidehiko SHIMIZU,  Haruo IWANO,  Yasuo FUKUSHIMA,  Kotaro NAGATA,  Yoichi HOSHI,  

[Date]2010/10/21
[Paper #]CPM2010-105
Preparation of two layers Organic Thin Film using Alq_3/PEDOT by spin coat

Hina CHUJO,  Atsushi NODA,  Nobuyuki IWATA,  Hiroshi YAMAMOTO,  

[Date]2010/10/21
[Paper #]CPM2010-106
Effects of Deposition Morphology of EL Phosphor on ZnO Nanorods on Characteristics of Lateral DCEL Devices

Tomomasa SATOH,  Yuki MATSUZAWA,  Takaki KANESHIRO,  Takashi HIRATE,  

[Date]2010/10/21
[Paper #]CPM2010-107
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[Date]2010/10/21
[Paper #]
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