Presentation 2010-10-29
Examination of ITO Thin Films Deposited at Low-temperature for OLEDs by Sputtering Method
Yohei NAKAMURA, Chag LIU, Hidehiko SHIMIZU, Haruo IWANO, Yasuo FUKUSHIMA, Kotaro NAGATA, Yoichi HOSHI,
PDF Download Page PDF download Page Link
Abstract(in Japanese) (See Japanese page)
Abstract(in English) In order to examine problems of the ITO films deposited at the low-temperature, the ITO films was deposited at the low-temperature by combined unbalanced magnetron sputtering method and substrate bias sputtering method. The ITO films deposited at the low-temperature were applied to the organic light emitting diode (OLED). As a result, The crystallinity of the ITO films improved as substrate bias voltage decreases. But, The resistivity of the ITO films did not improve as substrate bias voltage decreases. The characteristic of the voltage-current density and the voltage-luminescence of OLEDs with ITO films deposited at the low-temperature were not good. Therefore, the ITO films prepared in this study were insufficient for the electrode of the OLEDs.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) OLEDs / ITO thin film / low temperature / Unbalanced magnetron sputtering method
Paper # CPM2010-105
Date of Issue

Conference Information
Committee CPM
Conference Date 2010/10/21(1days)
Place (in Japanese) (See Japanese page)
Place (in English)
Topics (in Japanese) (See Japanese page)
Topics (in English)
Chair
Vice Chair
Secretary
Assistant

Paper Information
Registration To Component Parts and Materials (CPM)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Examination of ITO Thin Films Deposited at Low-temperature for OLEDs by Sputtering Method
Sub Title (in English)
Keyword(1) OLEDs
Keyword(2) ITO thin film
Keyword(3) low temperature
Keyword(4) Unbalanced magnetron sputtering method
1st Author's Name Yohei NAKAMURA
1st Author's Affiliation Graduate School of Science and Technology, Niigata University()
2nd Author's Name Chag LIU
2nd Author's Affiliation Graduate School of Science and Technology, Niigata University
3rd Author's Name Hidehiko SHIMIZU
3rd Author's Affiliation Faculty of Engineering, Niigata University
4th Author's Name Haruo IWANO
4th Author's Affiliation Faculty of Engineering, Niigata University
5th Author's Name Yasuo FUKUSHIMA
5th Author's Affiliation Faculty of Engineering, Niigata University
6th Author's Name Kotaro NAGATA
6th Author's Affiliation Faculty of Engineering, Niigata University
7th Author's Name Yoichi HOSHI
7th Author's Affiliation Faculty of Engineering, Tokyo Polytechnic University
Date 2010-10-29
Paper # CPM2010-105
Volume (vol) vol.110
Number (no) 261
Page pp.pp.-
#Pages 5
Date of Issue