Electronics-Component Parts and Materials(Date:2002/11/06)

Presentation
表紙

,  

[Date]2002/11/6
[Paper #]
目次

,  

[Date]2002/11/6
[Paper #]
Contact Resistance between Electrode and TaN Thin Film Resistor Deposited by Sputtering

Motoki OBATA,  Teruyuki SAKUDA,  Rinpei HAYASHIBE,  Kiichi KAMIMURA,  

[Date]2002/11/6
[Paper #]CPM2002-112
Composition Control of CuInS_2 Thin Films Prepared by the Reactive Sputtering Method Using CS_2 Gas

Shinobu KERA,  Satoshi KOBAYASHI,  Nozomu TUBOI,  

[Date]2002/11/6
[Paper #]CPM2002-113
Controlling properties of SrAl_2O_4 thin films by post-annealing of the film deposited by sputtering method

T. Ishii,  N. Ikeda,  H. Shimizu,  T. Maruyama,  H. Iwano,  K. Kato,  M. Ohta,  

[Date]2002/11/6
[Paper #]CPM2002-114
Preparation and evaluation of CuAlO_2 films by the facing targets spattering method

Yuji ITOH,  Yoshikazu TAKAHASHI,  Nozomu TUBOI,  Satoshi KOBAYASHI,  Hidehiko SHIMIZU,  Keizou KATOH,  Futao KANEKO,  

[Date]2002/11/6
[Paper #]CPM2002-115
Preparation of Conductive Re Oxide thin films by sputtering

Manabu OHKUBO,  Kumiko FUKAI,  Nobuyuki IWATA,  Hiroshi YAMAMOTO,  

[Date]2002/11/6
[Paper #]CPM2002-116
Effect of Water Vapor in the Sputter-deposition of ITO Thin Film at Low Temperature

Hiro-omi KATO,  Yoichi HOSHI,  

[Date]2002/11/6
[Paper #]CPM2002-117
Effect of Oxygen Pressure on Photocatalytic Phenomena in Reactive Sputter Deposited Anatase Films

Tomohiko NARUOKA,  Tomoaki MOMOSE,  Noriko BAMBA,  Tatsuo FUKAMI,  

[Date]2002/11/6
[Paper #]CPM2002-118
Evaluation of metal sputtering thin films using ATR method

T. Sato,  H. Watanabe,  K. Oguma,  H. Shimizu,  T. Maruyama,  F. Kaneko,  T. Kawakami,  H. Iwano,  

[Date]2002/11/6
[Paper #]CPM2002-119
Application of Ta_2O_5 based composites as a gate dielectric

K. M. A. Salam,  Hisashi Fukuda,  Shigeru Nomura,  

[Date]2002/11/6
[Paper #]CPM2002-120
Evaluation of thin film solar cell based on Cu_2ZnSnS_4 thin film prepared by sulfurization of evaporated precursors

Katsuhiko MORIYA,  Kazuyuki TSUCHIDA,  Hironori KATAGIRI,  

[Date]2002/11/6
[Paper #]CPM2002-121
Microwave Properties of epitaxial NbN/AlN/NbN Josephson tunnel junctions with high critical current densities

K. Okanoue,  H. Ishida,  A. Kawakami,  Z. Wang,  K. Hamasaki,  

[Date]2002/11/6
[Paper #]CPM2002-122
MBE growth of Si_0.75Ge_0.25 Alloy Layers Using (Si_14/Ge_1)_20 and (Si_28/Ge_2)_10 Short-period Superlattices

Rahman M. MIZANUR,  Kentaro KURUMATANI,  Toyokazo TAMBO,  Chiei TATSUYAMA,  

[Date]2002/11/6
[Paper #]CPM2002-123
Recent Development of Fabrication Techniques for Thin-Film Transistors by Catalytic Chemical Vapor Deposition

Atsushi MASUDA,  Hideki MATSUMURA,  

[Date]2002/11/6
[Paper #]CPM2002-124
Evaluation of Si c(4×4) structure formed using MMSi, DMSi

Masayuki HARASHIMA,  Yuzuru NARITA,  Kanji YASUI,  Tadashi AKAHANE,  

[Date]2002/11/6
[Paper #]CPM2002-125
Epitaxial growth of cubic GaN using Hot-wire CVD method

Mitsuyoshi ISHIBASHI,  Kai KANAUCHI,  Kanji YASUI,  Tadashi AKAHANE,  

[Date]2002/11/6
[Paper #]CPM2002-126
[OTHERS]

,  

[Date]2002/11/6
[Paper #]