Electronics-Component Parts and Materials(Date:1996/11/08)

Presentation
表紙

,  

[Date]1996/11/8
[Paper #]
目次

,  

[Date]1996/11/8
[Paper #]
Development of nano-meter-size micro-technology using metal titanium

Takashi Ono,  Kouji Fujimaru,  Hideki Matsumura,  

[Date]1996/11/8
[Paper #]CPM96-104
Study on the interfacial reaction and preferentially oriented growth of Al(111) plane in the Al/Nb/SiO_2/Si system

Tomoyuki Fukuda,  Mayumi Takeyama,  Atsushi Noya,  

[Date]1996/11/8
[Paper #]CPM96-105
Application of Ta-W alloy films as diffusion barriers for Cu/Si contact systems

Touko SASE,  Mayumi TAKEYAMA,  Atsushi NOYA,  

[Date]1996/11/8
[Paper #]CPM96-106
Barrier properties of W-nitride in the Cu/W-nitride/Si contact system

Mayumi TAKEYAMA,  Atsushi NOYA,  

[Date]1996/11/8
[Paper #]CPM96-107
Evaluation of Donor Adsorbed TCNQ Langmuir-Blodgett Films by Attenuated Total Reflection Method

Kenichi OHASHI,  Kazunari SHINBO,  Keizo KATO,  Futao KANEKO,  

[Date]1996/11/8
[Paper #]CPM96-108
IBE Growth and Luminescence Characteristics of Er-doped Silicon Films

Morito MATSUOKA,  Shun-ichi Tohno,  

[Date]1996/11/8
[Paper #]CPM96-109
Basic Characteristics of SiGe Epitaxial Growth by IBS

Kimihiro SASAKI,  Keiichi NAKATA,  Tomonobu HATA,  

[Date]1996/11/8
[Paper #]CPM96-110
CuInS_2 Thin Films by Spray Pyrolysis : Preparation and Properties

Satoshi KOBAYASHI,  Tohko KOIDE,  Takahiro KAWAKAMI,  Futao KANEKO,  

[Date]1996/11/8
[Paper #]CPM96-111
Sputter-Deposition of Co films Under Complete Thermalization Conditions

Kiyoshi ISHII,  Masami KAWAZU,  Hironori MINAMIDA,  

[Date]1996/11/8
[Paper #]CPM96-112
Preparation of Ba-Ferrite Thin Films by Post-annealing of The Film Deposited by Means of Alternate S Layer and R Layer Deposition Method

H. Shimizu,  H. Shinozaki,  I. Uehara,  S. Kon,  Y. Hoshi,  K. Kato,  F. Kaneko,  H. Ikawa,  

[Date]1996/11/8
[Paper #]CPM96-113
[OTHERS]

,  

[Date]1996/11/8
[Paper #]