Presentation | 1996/11/8 Sputter-Deposition of Co films Under Complete Thermalization Conditions Kiyoshi ISHII, Masami KAWAZU, Hironori MINAMIDA, |
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Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | By utilizing forced Ar gas flow through a hollow cathode target, effective sputter-deposition of films is allowable even at 1-Torr range. The sputtered particles are completely thermalized by collisions with Ar gas before depositing onto the substrate. It has been found that Co films having a fine columnar structure with distinct grain boundaries are obtained at considerably high rates by this peculiar process. |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | sputtering method / sputtered Film / gas-flow-sputtering / Co film |
Paper # | CPM96-112 |
Date of Issue |
Conference Information | |
Committee | CPM |
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Conference Date | 1996/11/8(1days) |
Place (in Japanese) | (See Japanese page) |
Place (in English) | |
Topics (in Japanese) | (See Japanese page) |
Topics (in English) | |
Chair | |
Vice Chair | |
Secretary | |
Assistant |
Paper Information | |
Registration To | Component Parts and Materials (CPM) |
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Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | Sputter-Deposition of Co films Under Complete Thermalization Conditions |
Sub Title (in English) | |
Keyword(1) | sputtering method |
Keyword(2) | sputtered Film |
Keyword(3) | gas-flow-sputtering |
Keyword(4) | Co film |
1st Author's Name | Kiyoshi ISHII |
1st Author's Affiliation | Faculty of Engineering, Utsunomiya University() |
2nd Author's Name | Masami KAWAZU |
2nd Author's Affiliation | Faculty of Engineering, Utsunomiya University |
3rd Author's Name | Hironori MINAMIDA |
3rd Author's Affiliation | Faculty of Engineering, Utsunomiya University |
Date | 1996/11/8 |
Paper # | CPM96-112 |
Volume (vol) | vol.96 |
Number (no) | 350 |
Page | pp.pp.- |
#Pages | 6 |
Date of Issue |