Electronics-Electron Devices(Date:2002/06/24)

Presentation
Stress Relaxation in Recrystallized Polycrystalline Si Film Formed by Excimer Laser Annealing

Nanya KAWAMOTO,  Hisashi ABE,  Naoto MATSUO,  Ryouhei TAGUCHI,  Tomoyuki NOUDA,  Hiroki HAMADA,  

[Date]2002/6/24
[Paper #]ED2002-154
Cu-Field Aided Lateral Crystallization (FALC) of Amorphous Silicon Films below 450℃

Kyoung-Wan Park,  Jeong-Eun You,  Duck-Kyun Choi,  

[Date]2002/6/24
[Paper #]ED2002-155
Double-Gate Poly-Si Thin-Film Transistors Fabricated Using Self-Aligned Technology

Kenji MAKIHIRA,  Kousuke NAKAGAWA,  Tanemasa ASANO,  

[Date]2002/6/24
[Paper #]ED2002-156
奥付

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[Date]2002/6/24
[Paper #]
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