| Presentation | 2002/6/24 Cu-Field Aided Lateral Crystallization (FALC) of Amorphous Silicon Films below 450℃ Kyoung-Wan Park, Jeong-Eun You, Duck-Kyun Choi, |
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| PDF Download Page | PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | By adopting a novel concept of Cu-field aided lateral crystallization (FALC) process, possibility of the low temperature crystallization of amorphous silicon films was investigated. When an electric field was applied to the selectively Cu-deposited (a-Si) film during the thermal annealing below 450℃, the lateral crystallization proceeded toward Cu-free region from negative electrode side to positive electrode side. Microstructures of the crystallized area were investigated and we confirmed that 800Å thick a-Si film was completely crystallized by Cu-FALC process below 450℃. Furthermore, we could successfully crystallize the a-Si at the temperature as low as 350℃ with an extremely fast crystallization velocity of 12 μm/h by Cu-FALC process. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | Cu-field aided lateral crystallization (Cu-FALC) / Poly-Si / metal catalyst / crystallization mediator / low temperature crystallization |
| Paper # | ED2002-155 |
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| Conference Information | |
| Committee | ED |
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| Conference Date | 2002/6/24(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
| Chair | |
| Vice Chair | |
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| Paper Information | |
| Registration To | Electron Devices (ED) |
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| Language | ENG |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Cu-Field Aided Lateral Crystallization (FALC) of Amorphous Silicon Films below 450℃ |
| Sub Title (in English) | |
| Keyword(1) | Cu-field aided lateral crystallization (Cu-FALC) |
| Keyword(2) | Poly-Si |
| Keyword(3) | metal catalyst |
| Keyword(4) | crystallization mediator |
| Keyword(5) | low temperature crystallization |
| 1st Author's Name | Kyoung-Wan Park |
| 1st Author's Affiliation | Department of Ceramic Engineering, Hanyang University() |
| 2nd Author's Name | Jeong-Eun You |
| 2nd Author's Affiliation | Department of Ceramic Engineering, Hanyang University |
| 3rd Author's Name | Duck-Kyun Choi |
| 3rd Author's Affiliation | Department of Ceramic Engineering, Hanyang University |
| Date | 2002/6/24 |
| Paper # | ED2002-155 |
| Volume (vol) | vol.102 |
| Number (no) | 175 |
| Page | pp.pp.- |
| #Pages | 5 |
| Date of Issue | |