Electronics-Silicon Devices and Materials(Date:2020/10/22)

Presentation
High capacitance density high breakdown voltage textured deep trench SiN capacitors toward 3D integration

Koga Saito(Tohoku Univ.),  Ayano Yoshida(Tohoku Univ.),  Rihito Kuroda(Tohoku Univ.),  Hiroshi Shibata(LAPIS Semiconductor Miyagi),  Taku Shibaguchi(LAPIS Semiconductor Miyagi),  Naoya kuriyama(LAPIS Semiconductor Miyagi),  Shigetoshi Sugawa(Tohoku Univ.),  

[Date]2020-10-22
[Paper #]SDM2020-15
Investigation on millisecond solid phase crystallization of amorphous silicon films induced by micro thermal plasma jet.

Hoa Thi Khanh Nguyen(Hiroshima Univ.),  Hiroaki Hanafusa(Hiroshima Univ.),  Yuri Mizukawa(Hiroshima Univ.),  Shohei Hayashi(Toray Res. Cent.),  Seiichiro Higashi(Hiroshima Univ.),  

[Date]2020-10-22
[Paper #]SDM2020-18
Lattice Matching and X-ray Structural Analysis of Ferroelectric Thin Film BiFeO3

Fuminobu Imaizumi(NIT, Oyama College),  Rikuto Nakada(NIT, Oyama College),  

[Date]2020-10-22
[Paper #]SDM2020-20
[Memorial Lecture] Atomic layer controlled etching process using plasma

Sho Kumakura(Tokyo Electron Miyagi),  

[Date]2020-10-22
[Paper #]SDM2020-14
Investigation of N-doped LaB6/LaBxNy/Si(100) MIS structure and floating-gate memory applications

Kyung Eun Park(Tokyo Tech),  Hideki Kamata(Tokyo Tech),  Shun-ichiro Ohmi(Tokyo Tech),  

[Date]2020-10-22
[Paper #]SDM2020-16
A two-step wet etching process for the integration of PdEr/HfO2 gate stack structure on the gate-first Schottky barrier MOSFET

Rengie Mark D. Mailig(Tokyo Tech),  Yuichiro Aruga(Tokyo Tech),  Shun-ichiro Ohmi(Tokyo Tech),  

[Date]2020-10-22
[Paper #]SDM2020-17
Modification of states of copper and copper oxide due to IPA treatment

Takezo Mawaki(Tohoku Univ.),  Akinobu Teramoto(Hiroshima Univ.),  Katsutoshi Ishii(Tokyo Electron Technology Solutions),  Yoshinobu Shiba(Tohoku Univ.),  Tomoyuki Suwa(Tohoku Univ.),  Shuji Azumo(Tokyo Electron Technology Solutions),  Akira Shimizu(Tokyo Electron Technology Solutions),  Kota Umezawa(Tokyo Electron Technology Solutions),  Rihito Kuroda(Tohoku Univ.),  Yasuyuki Shirai(Tohoku Univ.),  Shigetoshi Sugawa(Tohoku Univ.),  

[Date]2020-10-22
[Paper #]SDM2020-19
Effect of Drain-to-Source Voltage on Random Telegraph Noise Based on Statistical Analysis

Ryo Akimoto(Tohoku Univ.),  Rihito Kuroda(Tohoku Univ.),  Akinobu Teramoto(Hiroshima Univ.),  Takezo Mawaki(Tohoku Univ.),  Shinya Ichino(Tohoku Univ.),  Tomoyuki Suwa(Tohoku Univ.),  Shigetoshi Sugawa(Tohoku Univ.),  

[Date]2020-10-22
[Paper #]SDM2020-21