| Presentation | 2020-10-22 [Memorial Lecture] Atomic layer controlled etching process using plasma Sho Kumakura, |
|---|---|
| PDF Download Page |  PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | |
| Paper # | SDM2020-14 |
| Date of Issue | 2020-10-15 (SDM) |
| Conference Information | |
| Committee | SDM |
|---|---|
| Conference Date | 2020/10/22(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | virtual conference |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | Process Science and New Process Technology |
| Chair | Hiroshige Hirano(TowerPartners Semiconductor) |
| Vice Chair | Shunichiro Ohmi(Tokyo Inst. of Tech.) |
| Secretary | Shunichiro Ohmi(AIST) |
| Assistant | Taiji Noda(Panasonic) / Tomoyuki Suwa(Tohoku Univ.) |
| Paper Information | |
| Registration To | Technical Committee on Silicon Device and Materials |
|---|---|
| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | [Memorial Lecture] Atomic layer controlled etching process using plasma |
| Sub Title (in English) | |
| Keyword(1) | |
| 1st Author's Name | Sho Kumakura |
| 1st Author's Affiliation | Tokyo Electron Miyagi Ltd.(Tokyo Electron Miyagi) |
| Date | 2020-10-22 |
| Paper # | SDM2020-14 |
| Volume (vol) | vol.120 |
| Number (no) | SDM-205 |
| Page | pp.pp.1-6(SDM), |
| #Pages | 6 |
| Date of Issue | 2020-10-15 (SDM) |