Electronics-Silicon Devices and Materials(Date:2001/01/23)

Presentation
表紙

,  

[Date]2001/1/23
[Paper #]
目次

,  

[Date]2001/1/23
[Paper #]
[CATALOG]

,  

[Date]2001/1/23
[Paper #]
Critical Issues of ULSI Multilevel Interconnect Technology

Takamaro Kikkawa,  

[Date]2001/1/23
[Paper #]SDM2000-187
Process Design Methodology for Via-shape-controlled, Cu Dual-damascene Interconnects Tailored in Low-k Organic Film

Yoshihiro Hayashi,  Keizo Kinoshita,  Munehiro Tada,  Tatsuya Usami,  Masayuki Hiroi,  Takesi Tonegawa,  Kazutoshi Shiba,  Takahiro Onodera,  Masayoshi Tagami,  Saitoh Shinobu /,  

[Date]2001/1/23
[Paper #]SDM2000-188
Thick on-chip interconnections by Cu-damascene processes using a photosensitive polymer

Kunio Saito,  Shoji Yagi,  Toshihiko Kosugi,  Chikara Yamaguchi,  Kazuhisa Kudo,  Masaki Yano,  Hiromu Ishii,  Katsuyuki Machida,  Hakaru Kyuragi,  

[Date]2001/1/23
[Paper #]SDM2000-189
EVOLUTION OF GRAIN AND MICRO-VOID STRUCTURE IN ELECTROPLATED COPPER INTERCONNECTION LINES

A. Hobbs,  S. Murakami,  T. Hosoda,  S. Ohtsuka,  M. Miyajima,  S. Sugatani,  T. Nakamura,  

[Date]2001/1/23
[Paper #]SDM2000-190
Dielectric Breakdown in Damascene Cu Interconnection

Ken-ichi Takeda,  Kenji Hinode,  

[Date]2001/1/23
[Paper #]SDM2000-191
Effect of Phosphorous-Doped Low-k Dielectric Films on Copper Ion Drift

T. Oda,  S. Mukaigawa,  T. Aoki,  O. Fumayama,  T. Kikkawa,  

[Date]2001/1/23
[Paper #]SDM2000-192
In situ Chemical Vapor Deposition Manufacturing Processes of Barrier/ Copper Seed Films for Electroplating

Atsushi Sekiguchi,  Tomoaki Koide,  Minjuan Zhang,  Takafumi Kuninobu,  Hideki Sunayama,  Akiko Kobayashi,  Kaoru Suzuki,  Shiqin Xiao,  Osamu Okada,  

[Date]2001/1/23
[Paper #]SDM2000-193
Theoretical Derivation of Dielectric Constant for Low-k materials : Aiming to k<1.5 Interconnects process

Takuya Fukuda,  Nobuo Aoi,  Azuma Matsuura,  Hironori Matsunaga,  

[Date]2001/1/23
[Paper #]SDM2000-194
Film Characterization of Scmiconductor SiLK^* Dielectric Resin for BEOL Integration Process

Y. Ida,  A Oshima,  J. Waeterloos,  M. Mills,  E. Shaffer,  C. Mohler,  D. Castillo,  T. Stokich,  P. Townsend,  M. Radler,  K. Foster,  T. Narita,  

[Date]2001/1/23
[Paper #]SDM2000-195
Novel silica film with an ordered periodic pore structure

Hirohiko Murakami,  Takahiro Nakayama,  Hiroyuki Yamakawa,  Kazuhiro Yamada,  Nobuaki Seki,  Kouichi Tamagawa,  

[Date]2001/1/23
[Paper #]SDM2000-196
[OTHERS]

,  

[Date]2001/1/23
[Paper #]