Electronics-Silicon Devices and Materials(Date:1995/05/24)

Presentation
表紙

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[Date]1995/5/24
[Paper #]
目次

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[Date]1995/5/24
[Paper #]
A New Technique for Measuring Threshold Voltage Distribution in Flash EEPROM Devices

K. Kanda,  T. Himeno,  H. Hazama,  N. Matsukawa,  M. Oshikiri,  K. Masuda,  K. Sakui,  Y. Itoh,  K. Hashimoto,  J. Miyamoto,  

[Date]1995/5/24
[Paper #]
Application of Charge Pumping Technique to analyze the memory characteristic degradation of a Flash EEPROM device

K. Yamamoto,  K. Ohnishi,  Y. Takahashi,  J. Satoh,  

[Date]1995/5/24
[Paper #]
Electrical Gate Length Measurement Test Structure For Short Channel MOSFET Characteristics Evaluation

Naoki Kasai,  Ichiro Yamamoto,  Kuniaki Koyama,  

[Date]1995/5/24
[Paper #]
Modeling of Dynamic Leak Current in High Frequency Operation of CMOS Circuits Fabricated on SOI Substrate

H. Ito,  K. Asada,  

[Date]1995/5/24
[Paper #]
Electron Density Dependence of Inversion Layer Mobility Limited by Coulomb Scattering and Surface Roughness Scattering in Si MOSFETs

Junji Koga,  Shin-ichi Takagi,  Akira Toriumi,  

[Date]1995/5/24
[Paper #]
A New Characterization of Sub-μm Parallel Multilevel Interconnects and its Experimental Verification

/ /,  Katsumi Tsuneno,  Hisako Sato,  Takahide Nakamura,  Hiroo Masuda,  

[Date]1995/5/24
[Paper #]
Experimental Study of Electromigration at Grain Boundaries with a Test Structure Using the Single-crystal Aluminum Interconnection

Koichi Kusuyama,  Yasushi Nakajima,  Yoshinori Murakami,  

[Date]1995/5/24
[Paper #]
Reliability evaluation of thin gate oxide using a flat capacitor test structure

Masafumi Katsumat,  Junichi Mitsuhasi,  Kiyoteru Kobayasi,  Youji Mashiko,  Hiroshi Koyama,  

[Date]1995/5/24
[Paper #]
High Quality Ultra-Thin Gate Oxide

Kanetake Takasaki,  

[Date]1995/5/24
[Paper #]
Reliability of ultra-dry-processed ultrathin silicon oxide films

Hiroshi Yamada,  

[Date]1995/5/24
[Paper #]
Evaluation of Latent Damage in Oxide Films due to Plasma Exposure

Hiroyoshi Kitabayashi,  Hirotaka Muto,  Haruhisa Fujii,  Shigenori Sakamori,  Hiroshi Miyatake,  

[Date]1995/5/24
[Paper #]
Effect of Nitrogen Profile on Tunnel Oxynitride Degradation with Charge Injection Polarity

T. Arakawa,  R. Matsumoto,  A. Kita,  

[Date]1995/5/24
[Paper #]
Generalized Diffusion-Reaction Model for the Bias-Temperature Instability at the Si-SiO_2 Interface

Shigeo Ogawa,  

[Date]1995/5/24
[Paper #]
[OTHERS]

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[Date]1995/5/24
[Paper #]