| Presentation | 2009-10-30 Lowering of the AZO film's resisitivity by hydrogen radical annealing Yutaka Oshima, Masami Tahara, Mohd Hanif, Hironori Katagiri, Kazuo Jinbo, Yuichiro Kuroki, Masasuke Takata, Kanji Yasui, |
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| PDF Download Page |  PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | Al doped ZnO (AZO) films has been deposited by a radio frequency (rf) magnetron sputtering with a third electrode. The resistivity of the AZO films has decreased and its uniformity has also been improved by hydrogen plasma annealing. In order to further lower the resistivity of the AZO films, hydrogen annealing using the hydrogen radicals generated on a tungsten hot-mesh was investigated. As a result, both the electron density and Hall mobility increased at the tungsten mesh temperatures of 1100-1300℃. However, the crystallinity of the ZnO films deteriorated and their electron densites greatly decreased by the hydrogen radical annealing at the tungsten mesh temperatures higher than 1400℃. The increase in the Hall mobility was considered to be due to the reduction of the adsorbed oxygen on the grain boundary by the hydrogen annealing. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | AZO / rf magnetron sputtering / hot-mesh / hydrogen radical |
| Paper # | CPM2009-97 |
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| Conference Information | |
| Committee | CPM |
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| Conference Date | 2009/10/22(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
| Chair | |
| Vice Chair | |
| Secretary | |
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| Paper Information | |
| Registration To | Component Parts and Materials (CPM) |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Lowering of the AZO film's resisitivity by hydrogen radical annealing |
| Sub Title (in English) | |
| Keyword(1) | AZO |
| Keyword(2) | rf magnetron sputtering |
| Keyword(3) | hot-mesh |
| Keyword(4) | hydrogen radical |
| 1st Author's Name | Yutaka Oshima |
| 1st Author's Affiliation | Faculty of Engineering Nagaoka University of Technology() |
| 2nd Author's Name | Masami Tahara |
| 2nd Author's Affiliation | Faculty of Engineering Nagaoka University of Technology |
| 3rd Author's Name | Mohd Hanif |
| 3rd Author's Affiliation | Faculty of Engineering Nagaoka University of Technology |
| 4th Author's Name | Hironori Katagiri |
| 4th Author's Affiliation | Nagaoka National College of Technology |
| 5th Author's Name | Kazuo Jinbo |
| 5th Author's Affiliation | Nagaoka National College of Technology |
| 6th Author's Name | Yuichiro Kuroki |
| 6th Author's Affiliation | Faculty of Engineering Nagaoka University of Technology |
| 7th Author's Name | Masasuke Takata |
| 7th Author's Affiliation | Faculty of Engineering Nagaoka University of Technology |
| 8th Author's Name | Kanji Yasui |
| 8th Author's Affiliation | Faculty of Engineering Nagaoka University of Technology |
| Date | 2009-10-30 |
| Paper # | CPM2009-97 |
| Volume (vol) | vol.109 |
| Number (no) | 256 |
| Page | pp.pp.- |
| #Pages | 5 |
| Date of Issue | |