Presentation 2006-11-24
Surface passivation dependency of 1/f noise characterization in AlGaN/GaN HEMT
T. Matsushima, M. Nakajima, K. Nomoto, M. Satoh, T. Nakamura,
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Abstract(in English) It is known that an electric characteristic of AlGaN/GaN HEMT is greatly influenced according to the kind and the film thickness of the surface passivation. In this research, the influence that the surface passivation in AlGaN/GaN HEMT gave to 1/f noise was examined. The influence that the growth condition of surface passivation (SiN film) exerted on 1/f noise characteristic was evaluated and examined. The device where the surface protection film formed by the PECVD method piles up was able to be decreased compared with the device where the surface passivation formed by the spatter method piles up and to decrease input conversion drain current spectrum density Svg to about the half.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) AlGaN/GaN HEMT / 1/f noise / Surface Passivation / PECVD / Spatter
Paper # R2006-36,ED2006-181,SDM2006-199
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Committee R
Conference Date 2006/11/17(1days)
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Language JPN
Title (in Japanese) (See Japanese page)
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Title (in English) Surface passivation dependency of 1/f noise characterization in AlGaN/GaN HEMT
Sub Title (in English)
Keyword(1) AlGaN/GaN HEMT
Keyword(2) 1/f noise
Keyword(3) Surface Passivation
Keyword(4) PECVD
Keyword(5) Spatter
1st Author's Name T. Matsushima
1st Author's Affiliation Hosei University()
2nd Author's Name M. Nakajima
2nd Author's Affiliation Hosei University
3rd Author's Name K. Nomoto
3rd Author's Affiliation Hosei University
4th Author's Name M. Satoh
4th Author's Affiliation Hosei University
5th Author's Name T. Nakamura
5th Author's Affiliation Hosei University
Date 2006-11-24
Paper # R2006-36,ED2006-181,SDM2006-199
Volume (vol) vol.106
Number (no) 377
Page pp.pp.-
#Pages 5
Date of Issue