| Presentation | 2015-04-17 Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen Kensaku Kanomata, Hisashi Ohba, P. Pungboon Pansila, Bashir Ahmmad Arima, Shigeru Kubota, Kazuhiro Hirahara, Fumihiko Hirose, |
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| PDF Download Page |  PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | Room-temperature atomic layer deposition (ALD) of hafnium dioxide is developed using tetrakis(ethylmethylamino)hafnium (TEMAH) and plasma-excited water and oxygen vapor generated from a remote plasma source. The plasma-excited water and oxygen vapor is effective in oxidizing the TEMAH-adsorbed HfO2 surface while leaving OH sites on the growing surface at room temperature for further TEMAH adsorption. The growth rate is measured to be 0.26 nm/cycle at room temperature. The TEMAH adsorption and its oxidation on HfO2 were investigated by multiple-internal-refraction infrared absorption spectroscopy (MIR-IRAS). In thin work, we constructed a reaction model of the RT HfO2 ALD by MIR-IRAS and adsorption site fitting. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | ALD / TEMAH / Plasma-excited H2O and O2 / MIR-IRAS / Plasma optical spectroscopy |
| Paper # | ED2015-11 |
| Date of Issue | 2015-04-09 (ED) |
| Conference Information | |
| Committee | ED |
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| Conference Date | 2015/4/16(2days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | Laboratory for Nanoelectronics and Spintronics |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
| Chair | Naoki Hara(Fujitsu Labs.) |
| Vice Chair | Koichi Maezawa(Univ. of Toyama) |
| Secretary | Koichi Maezawa(Hokkaido Univ.) |
| Assistant | Toshikazu Suzuki(JAIST) / Manabu Arai(New JRC) |
| Paper Information | |
| Registration To | Technical Committee on Electron Device |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen |
| Sub Title (in English) | |
| Keyword(1) | ALD |
| Keyword(2) | TEMAH |
| Keyword(3) | Plasma-excited H2O and O2 |
| Keyword(4) | MIR-IRAS |
| Keyword(5) | Plasma optical spectroscopy |
| 1st Author's Name | Kensaku Kanomata |
| 1st Author's Affiliation | Yamagata University(Yamagata Univ.) |
| 2nd Author's Name | Hisashi Ohba |
| 2nd Author's Affiliation | Yamagata University(Yamagata Univ.) |
| 3rd Author's Name | P. Pungboon Pansila |
| 3rd Author's Affiliation | Yamagata University(Yamagata Univ.) |
| 4th Author's Name | Bashir Ahmmad Arima |
| 4th Author's Affiliation | Yamagata University(Yamagata Univ.) |
| 5th Author's Name | Shigeru Kubota |
| 5th Author's Affiliation | Yamagata University(Yamagata Univ.) |
| 6th Author's Name | Kazuhiro Hirahara |
| 6th Author's Affiliation | Yamagata University(Yamagata Univ.) |
| 7th Author's Name | Fumihiko Hirose |
| 7th Author's Affiliation | Yamagata University(Yamagata Univ.) |
| Date | 2015-04-17 |
| Paper # | ED2015-11 |
| Volume (vol) | vol.115 |
| Number (no) | ED-5 |
| Page | pp.pp.53-58(ED), |
| #Pages | 6 |
| Date of Issue | 2015-04-09 (ED) |