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| Presentation | 2015-04-17 09:55 Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen Kensaku Kanomata, Hisashi Ohba, P. Pungboon Pansila, Bashir Ahmmad Arima, Shigeru Kubota, Kazuhiro Hirahara, Fumihiko Hirose (Yamagata Univ.) |
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| PDF Download Link |  ED2015-11 Link to ES Tech. Rep. Archives: ED2015-11 |
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