Electronics-Silicon Devices and Materials(Date:2005/09/29)

Presentation
表紙

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[Date]2005/9/29
[Paper #]
目次

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[Date]2005/9/29
[Paper #]
A Study of Barrier-Metal-Clad Copper Interconnection Technology Using Self-Aligned Metal Caps

Tatsuyuki SAITO,  Hiroshi ASHIHARA,  Kensuke ISHIKAWA,  Masanori MIYAUCHI,  Tomio IWASAKI,  

[Date]2005/9/29
[Paper #]SDM2005-173
Development of Novel Electric Conductivity Evaluation Method Based on Quantum Chemical Molecular Dynamics and Its Application to Materials for Silicon Devices

Hideyuki TSUBOI,  Chutia ARUNABIHIRAM,  Zhigang ZHU,  Michihisa KOYAMA,  Akira ENDOU,  Momoji KUBO,  CARPIO Carlos A. DEL,  Akira MIYAMOTO,  

[Date]2005/9/29
[Paper #]SDM2005-174
Fabrication of Multi SOI Layers by Selective Etching of SiGe in Multi Si/SiGe Layers and its Application to Multi SOI Layers Formations

Tomoyuki NAKANISHI,  Hiroshi TAKAHASHI,  Kenichi YAHASHI,  Shunichiro OHMI,  Tetsushi SAKAI,  

[Date]2005/9/29
[Paper #]SDM2005-175
Chemisorption of Hydroxyl-group on Silicon Surface

Yoshihiro SUGITA,  Takashi ITO,  

[Date]2005/9/29
[Paper #]SDM2005-176
Fabrication of ultra clean silicon surface

Kazumasa Kawase,  Hiroshi Umeda,  Masao Inoue,  Tomoyuki Suwa,  Masaaki Higuchi,  Akinobu Teramoto,  Shigetoshi Sugawa,  Tadahiro Ohmi,  

[Date]2005/9/29
[Paper #]SDM2005-177
Hydrogen-induced defect generation in SiO2

Masayasu MIYATA,  DUIN Adri C. T. VAN,  KHELI Jamil TAHIR,  III William A. GODDARD,  

[Date]2005/9/29
[Paper #]SDM2005-178
Suppression of the low frequency noise level in (100) and (110) oriented silicon p-MOSFETs induced by an alkali-free cleaning process

Philippe GAUBERT,  Akinobu TERAMOTO,  Tatsufumi HAMADA,  Masashi YAMAMOTO,  Tadahiro OHMI,  

[Date]2005/9/29
[Paper #]SDM2005-179
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[Date]2005/9/29
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[Date]2005/9/29
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[Date]2005/9/29
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