Electronics-Silicon Devices and Materials(Date:1997/11/21)

Presentation
表紙

,  

[Date]1997/11/21
[Paper #]
目次

,  

[Date]1997/11/21
[Paper #]
0.15μm Electron Beam Direct Writing for Gbit DRAM Fabrication

Ken Nakajima,  Hiroshi Yamashita,  Yoshikatsu Kojima,  Satomi Hirasawa,  Takao Tamura,  Yasuhisa Yamada,  Kenichi Tokunaga,  Takahiro Ema,  Kenji Kondoh,  Naka Onoda,  Hiroshi Nozue,  

[Date]1997/11/21
[Paper #]SDM97-155
Proximity Effect Correction for Block Exposure System

T. Nagata,  Y. Manabe,  Y. Nara,  Y. Machida,  

[Date]1997/11/21
[Paper #]SDM97-156
The Effect of Down-Flow Cleaning Process on Materials Used in an EB System

Naoharu Shimomura,  Munehiro Ogasawara,  Kenji Ohtoshi,  Satoshi Yamasaki,  Yuji Fukudome,  Ryoichi Hirano,  Shuichi Tamamushi,  Toru Tojo,  Tadahiro Takigawa,  

[Date]1997/11/21
[Paper #]SDM97-157
Present Status and Future Prospects of EUV Lithography

Hiroo Kinoshita,  

[Date]1997/11/21
[Paper #]SDM97-158
Current status and future prospect of ArF lithography

Takeshi Ohfuji,  Koichi Kuhara,  Masaru Sasago,  

[Date]1997/11/21
[Paper #]SDM97-159
Optical Lithography in 0.1-μm regime : Potential and problems

Hiroshi Fukuda,  

[Date]1997/11/21
[Paper #]SDM97-160
Sub-Quarter-Micron Logic-Gate-Pattern Fabrication Using Halftone Phase-Shifting Masks

Akihiro Otaka,  Yoshio Kawai,  

[Date]1997/11/21
[Paper #]SDM97-161
Development of Fast Optical Proximity Correction & Verification System

Sachiko Kobayashi,  Kazuko Yamamoto,  Taiga Uno,  

[Date]1997/11/21
[Paper #]SDM97-162
Enhancement of Dry Etching Resistance of Chemically Amplified Resist by Ion Implantation Method

Satoru Shimada,  Kiyoshi Shibata,  Keiichi Ueda,  Keiji Ogata,  Ryu Shimizu,  Mitsuaki Morigami,  Hiroshi Hanafusa,  Keiichi Yodoshi,  

[Date]1997/11/21
[Paper #]SDM97-163
[OTHERS]

,  

[Date]1997/11/21
[Paper #]