IEICE Technical Committee Submission System
Conference Schedule
Online Proceedings
[Sign in]
Tech. Rep. Archives
    [Japanese] / [English] 
( Committee/Place/Topics  ) --Press->
 
( Paper Keywords:  /  Column:Title Auth. Affi. Abst. Keyword ) --Press->

All Technical Committee Conferences  (Searched in: All Years)

Search Results: Conference Papers
 Conference Papers (Available on Advance Programs)  (Sort by: Date Descending)
 Results 1 - 14 of 14  /   
Committee Date Time Place Paper Title / Authors Abstract Paper #
SDM, EID, ITE-IDY [detail] 2019-12-24
16:00
Nara NAIST Stable Growth of (100)-Oriented Low Angle Grain Boundary Silicon Thin Films Extending to the length of 3000 μm by a Continuous-Wave Laser Lateral Crystallization
Muhammad Arif Razali, Nobuo Sasaki, Yasuaki Ishikawa, Yukiharu Uraoka (NAIST)
The continuous wave laser lateral crystallization of amorphous-Si on quartz produces a {100}-oriented grain-boundary fre... [more]
US 2014-12-15
13:30
Tokyo Tokyo Institute of Technology, Suzukakedai Campus Fundamental Study on Ultrasonic-Vibration Abrasive Process of Polycrystalline Diamond-End Mill
Takeshi Watanabe, Takashi Goto (NS Tool), Masahiko Jin (Nippon Inst. of Tech.) US2014-65
Polycrystalline diamond (PCD) end mills are expected as a novel cutting tool that can finish the molds and machine parts... [more] US2014-65
pp.1-4
SDM, EID 2014-12-12
14:00
Kyoto Kyoto University Characterization of Synchronous and Asynchronous Circuits using poly-Si TFTs
Yosuke Nagase (Ryukoku Univ.), Tokiyoshi Matsuda, Mutsumi Kimura (Osaka Univ.), Taketoshi Matsumoto, Hikaru Kobayashi (Ryukoku Univ.) EID2014-25 SDM2014-120
We have evaluated multiple-input NAND circuits using polycrystalline silicon thin-film transistors and found that the ou... [more] EID2014-25 SDM2014-120
pp.61-65
SCE 2012-01-26
14:20
Tokyo Kikai-Shinko-Kaikan Bldg. B3-2 Imaging of anisotropic photo-induced current on semiconductors using laser-SQUID microscopy
Takashi Hino, Yoshihiro Nakatani, Yuji Miyato, Hideo Itozaki (Osaka Univ.) SCE2011-25
Photocurrent flows from a point where a semiconductor, a polycrystalline silicon solar cell, is irradiated by a focused ... [more] SCE2011-25
pp.35-39
SDM 2011-12-16
16:00
Nara NAIST Development of Low-Temperature Crystallization Method of Thin Film Semiconductor Using Soft X-ray Source
Akira Heya, Yuki Nonomura, Shota Kino, Naoto Matsuo (Univ. Hyogo), Sho Amano (LASTI Univ. Hyogo), Shuji Miyamoto, Kazuhiro Kanda, Takayasu Mochizuki (Univ. Hyogo), Kaoru Toko, Taizoh Sadoh, Masanobu Miyao (Kyushu Univ.) SDM2011-145
It is necessary two processes (crystal-nucleus formation and crystal grain growth) for crystallization. In general, the ... [more] SDM2011-145
pp.71-76
SDM 2011-07-04
16:40
Aichi VBL, Nagoya Univ. Simultaneous Crystallization of Double-Layered Si Thin Films and Fabciration of Thin Film Devices
Masahiro Horita, Koji Yamasaki, Emi Machida, Yasuaki Ishikawa, Yukiharu Uraoka (NAIST) SDM2011-68
We investigate simultaneous crystallization of double-layered silicon thin films on glass substrates by means of green l... [more] SDM2011-68
pp.103-108
ED 2010-04-23
10:45
Yamagata   Organic gate FETs for charactrizing carrier transport in polycrystalline Si
Masaki Hashimoto, Takahiko Suzuki, Fumihiko Hirose (Yamagata Univ.) ED2010-14
We fabricated organic gate Si FETs with Schottky contacts with a temperature of less than 150ºC to extract carrier ... [more] ED2010-14
pp.61-65
SDM 2009-11-12
14:40
Tokyo Kikai-Shinko-Kaikan Bldg. Surface-Potential-Based Drain Current Model for Thin-Film Transistors
Hiroshi Tsuji (Osaka Univ/JST), Yoshinari Kamakura, Kenji Taniguchi (Osaka Univ.) SDM2009-138
A new surface-potential-based drain current model for polycrystalline silicon thin-film transistors (poly-Si TFTs) is pr... [more] SDM2009-138
pp.19-22
OME, SDM 2009-04-24
17:05
Saga AIST Kyushu-center Metal Induced Lateral Crystallization of PECVD a-Si and Its Impact on TFT Performance
Shintaro Kanoh, Sho Nagata, Gou Nakagawa, Tanemasa Asano (Kyushu Univ.) SDM2009-7 OME2009-7
In the case of solid phase crystallization of amorphous Si (a-Si) deposited by plasma-enhanced chemical vapor deposition... [more] SDM2009-7 OME2009-7
pp.29-34
ED 2009-04-24
13:25
Miyagi Tohoku Univ. Growth of polycrystalline Si on plastic substrate using pulsed-plasma CVD under near atmospheric Pressure
Shogo Murashige, Mitsutaka Matsumoto, Yohei Inayoshi, Maki Suemitsu (Tohoku Univ.), Setsuo Nakajima, Tsuyoshi Uehara (Sekisui Chemicals Co. Ltd), Yasutake Toyoshima (AIST-ETRI) ED2009-15
Polycrystalline Si films have been deposited on polyethylene terephthalate(PET) substrates using pulsed-plasma CVD under... [more] ED2009-15
pp.63-67
SDM, OME 2008-04-11
11:00
Okinawa Okinawa Seinen Kaikan Investigation on Characteristic Variation of Polycrystalline-Si Thin Film Transistor Having Stripe Channels
Koji Akiyama, Kazunori Watanabe, Tanemasa Asano (Graduate school, Kyushu Univ.) SDM2008-5 OME2008-5
Thin Film Transistors (TFTs) having strip channels were fabricated on laterally grown polycrystalline silicon film prepa... [more] SDM2008-5 OME2008-5
pp.23-26
SDM, OME 2008-04-11
11:50
Okinawa Okinawa Seinen Kaikan Application of Si Thin-Film to Photo-Sensor Device
Mitsuharu Tai, Yasutaka Konno, Mutsuko Hatano (CRL, Hitachi), Toshio Miyazawa (Hitachi Displays) SDM2008-7 OME2008-7
In order to integrate new functions into display panel, thin-film transistor is considered as photo-sensor device, and i... [more] SDM2008-7 OME2008-7
pp.33-36
SDM, OME 2008-04-12
11:00
Okinawa Okinawa Seinen Kaikan Microstructural Analysis of Polycrystalline Silicon Thin Films Formation Behavior during Aluminum Induced Crystallization
Ken-ichi Ikeda (Kyushu Univ.), Takeshi Hirota (Mitsubishi Heavy Industries Ltd.), Kensuke Fujimoto (Kyushu Univ.), Youhei Sugimoto (Seiko Epson Corp.), Naoki Takata (Tokyo Inst. Tech.), Seiichiro Ii (Sojo Univ.), Hideharu Nakashima, Hiroshi Nakashima (Kyushu Univ.) SDM2008-19 OME2008-19
The formation behavior of polycrystalline silicon thin films during the aluminum induced crystallization (AIC) was inves... [more] SDM2008-19 OME2008-19
pp.95-100
OME, SDM, ED 2007-04-20
13:25
Fukuoka   Very Fine Droplet Ejection from Electro-Static Inkjet Nozzle and Its Aplication to Metal Induced Crystallization of Silicon
Yuji Ishida, Gou Nakagawa, Tanemasa Asano (Kyushu Univ.) ED2007-2 SDM2007-2 OME2007-2
Droplet ejection from an electrostatic inkjet nozzle having a needle has been investigated. It is found that reducing th... [more] ED2007-2 SDM2007-2 OME2007-2
pp.5-10
 Results 1 - 14 of 14  /   
Choose a download format for default settings. [NEW !!]
Text format pLaTeX format CSV format BibTeX format
Copyright and reproduction : All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)


[Return to Top Page]

[Return to IEICE Web Page]


The Institute of Electronics, Information and Communication Engineers (IEICE), Japan