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Technical Committee on Component Parts and Materials (CPM) [schedule] [select]
Chair Kanji Yasui (Nagaoka Univ. of Tech.)
Vice Chair Yasushi Takemura (Yokohama National Univ.)
Secretary Tadayuki Imai (NTT), Satoru Noge (Numazu National College of Tech.)
Assistant Toshishige Shimamura (NTT), Katsuya Abe (Shinshu Univ.)

Conference Date Thu, Jul 29, 2010 13:30 - 16:40
Fri, Jul 30, 2010 09:30 - 12:10
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Thu, Jul 29 PM 
13:30 - 16:40
(1) 13:30-13:55 Fabrication of CuInO2 thin films using RF sputtering and studies of annealing effects Tsubasa Ogawa, Takuya Yokomoto, Rinpei Hayashibe, Tomohiko Yamakami, Katsuya Abe (Shinshu Univ.)
(2) 13:55-14:20 Growth of Fe3O4/GaAs Epitaxial Thin Films by Gas Flow Sputtering CPM2010-31 Hiroshi Sakuma, Yuki Shidara, Yasuhito Kagi, Ryo Suzuki, Kiyoshi Ishii (Utsunomiya Univ.)
(3) 14:20-14:45 Characteristic of AZO thin films deposited at room temperature by sputtering method CPM2010-32 Hidehiko Shimizu, Jun Kashiide, Haruo Iwano, Takahiro Kawakami, Yasuo Fukushima, Kotaro Nagata (Niigata Univ.), Yoichi Hoshi (Tokyo Polytechnic Univ.)
  14:45-14:55 Break ( 10 min. )
(4) 14:55-15:20 Epitaxial growth of ZnO films using hot water molecules generated by catalytic reaction CPM2010-33 Masami Tahara, Hitoshi Miura, Tomoyoshi Kuroda, Hiroshi Nishiyama, Kanji Yasui (Nagoka Univ. of Tech.)
(5) 15:20-15:45 Proposal and Experimental Evaluation of A Novel Method for Eye-Pattern Improvement on Transmission Lines CPM2010-34 Masami Ishiguro, Yuki Shimauchi, Noriyuki Aibe (Tsukuba Univ.), Ikuo Yoshihara (Miyazaki Univ.), Moritoshi Yasunaga (Tsukuba Univ.)
  15:45-15:50 Break ( 5 min. )
(6) 15:50-16:40 [Invited Talk]
Science in porosity engineering of low-k dielectrics using supercritical carbon dioxide
-- Pore characterization and pore cleaning --
CPM2010-35
Eiichi Kondoh (Univ. of Yamanashi.)
Fri, Jul 30 AM 
09:30 - 12:10
(7) 09:30-09:55 Low temperature of deposition of ZrNx film using radical reaction CPM2010-36 Masaru Sato, Mayumi B. Takeyama (kitami Inst. of Tech.), Yuichiro Hayasaka, Eiji Aoyagi (Tohoku Univ.), Atsushi Noya (kitami Inst. of Tech.)
(8) 09:55-10:20 Atomic layer deposition (ALD) of vanadium nitride films using TDEAV CPM2010-37 Mayumi B. Takeyama, Masaru Sato (kitami Inst. of Tech.), Hiroshi Sudoh, Hideaki Machida (Gas-phase Growth Ltd.), Shun Ito, Eiji Aoyagi (Tohoku Univ.), Atsushi Noya (kitami inst. of tech.)
(9) 10:20-10:45 Formation of AlN films on Si substrate by Pulsed Laser Deposition CPM2010-38 Hideki Nakazawa, Daiki Suzuki, Ryoichi Osozawa, Hiroshi Okamoto (Hirosaki Univ.)
  10:45-10:55 Break ( 10 min. )
(10) 10:55-11:20 Field Emission from Horizontally Aligned Carbon Nanotube CPM2010-39 Hirofumi Saito, Tomohiko Yamakami, Rinpei Hayashibe, Takumi Ooike, Masahiro Yamashita, Kiichi Kamimura (Shinshu Univ.)
(11) 11:20-11:45 Photo-Assisted Polymerization of C60 Synthesized by Liquid-Liquid-Interfacial Precipitation Method CPM2010-40 Daiki Koide, Shota Katou, Eri Ikeda, Nobuyuki Iwata, Hiroshi Yamamoto (Nihon Univ.)
(12) 11:45-12:10 Characteristics of Visible Light Emission from Sn-doped SiO2 Thin Films by UV Irradiation CPM2010-41 Shota Mochizuki, Satoru Noge (Numazu Nat Coll. of Tech.)

Announcement for Speakers
General TalkEach speech will have 20 minutes for presentation and 5 minutes for discussion.
Invited TalkEach speech will have 40 minutes for presentation and 10 minutes for discussion.

Contact Address and Latest Schedule Information
CPM Technical Committee on Component Parts and Materials (CPM)   [Latest Schedule]
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Last modified: 2010-06-24 09:15:46


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