IEICE Technical Committee Submission System
Advance Program
Online Proceedings
[Sign in]
Tech. Rep. Archives
 Go Top  Go Back   Prev CPM Conf / Next CPM Conf [HTML] / [HTML(simple)] / [TEXT]  [Japanese] / [English] 

===============================================
Technical Committee on Component Parts and Materials (CPM)
Chair: Fumihiko Hirose (Yamagata Univ.) Vice Chair: Mayumi Takeyama (Kitami Inst. of Tech.)
Secretary: Yuichi Nakamura (Toyohashi Univ. of Tech.), Yuichi Akage (NTT)
Assistant: Yasuo Kimura (Tokyo Univ. of Tech.), Hideki Nakazawa (Hirosaki Univ.), Tomoaki Terasako (Ehime Univ.)

DATE:
Thu, Aug 9, 2018 14:30 - 16:45
Fri, Aug 10, 2018 09:30 - 11:45

PLACE:
Room 405 General Education Building, Bunkyo-cho Campus, Hirosaki University(1 Bunkyo-cho, Hirosaki, Aomori 036-8560, Japan. http://www.hirosaki-u.ac.jp/en/access/map/bunkyocho.html. Hideki Nakazawa, Hirosaki University. +81-172-39-3557)

TOPICS:
Component Parts and Materials, etc.

----------------------------------------
Thu, Aug 9 PM (14:30 - 16:45)
----------------------------------------

(1) 14:30 - 14:50
Effects of nitrogen doping on the properties of Si-doped DLC films
Kazuki Nakamura, Haruka Oohashi (Hirosaki Univ.), Tai Yokoyama, Kei-ichiro Tajima, Norihumi Endo, Maki Suemitsu (Tohoku Univ.), Yoshiharu Enta, Yasuyuki Kobayashi, Yushi Suzuki, Hideki Nakazawa (Hirosaki Univ.)

(2) 14:50 - 15:10
Growth of graphene on SiC/AlN/Si(110) substrates
Hideki Nakazawa, Syunki Narita, Yuki Nara, Yoshiharu Enta (Hirosaki Univ.)

(3) 15:10 - 15:30
Investigation of formation conditions of SiC buffer layers for SiC/SiC buffer layer/AlN/Si(110) multilayer structures
Yuki Nara, Asahi Kudo, Hideki Nakazawa (Hirosaki Univ.)

----- Break ( 15 min. ) -----

(4) 15:45 - 16:05
Developement of production-scale atomic layer deposition and its application for anticorrosion coating
Fumihiko Hirose (Yamagata)

(5) 16:05 - 16:25
Study on the formation mechanism of Bi-mediated Ge nanodots fabricated by vacuum evaporation
Kazuto Tsushima, Kensuke Takita, Hideki Nakazawa (Hirosaki Univ.), Takehiko Tawara, Kouta Tateno, Guoqiang Zhang, Hideki Gotoh (NTT), Takayuki Ikeda, Seiichiro Mizuno (NTT-AT), Hiroshi Okamoto (Hirosaki Univ.)

(6) 16:25 - 16:45
Fabrication and properties of multiferroic composites for optical modulation
Yuichi Nakamura, Naohide Kamada, Taichi Goto, Hironaga Uchida, Mitsuteru Inoue (Toyohashi Tech.)

----------------------------------------
Fri, Aug 10 AM (09:30 - 11:45)
----------------------------------------

(7) 09:30 - 09:50
Nitrogen doping to ZnO films using NO gas excited on heated Ir wire surface in a catalytic reaction-assisted chemical vapor deposition
Yuuki Adachi, Ryuta Iba, Shotarou Ono (Nagaoka Univ. Technol.), Koichirou Ooishi, Hironori Katagiri (Nagaoka College), Kanji Yasui (Nagaoka Univ. Technol.)

(8) 09:50 - 10:10
Relationship between taste evaluation of Ezoshika meat and electrical measurement
Mayumi B. Takeyama (Kitami Inst. & Technol.), Shinji Yokogawa (UEC), Masaru Sato, Takashi Yasui (Kitami Inst. & Technol.)

(9) 10:10 - 10:30
Characterization of ZrOxNy thin films deposited at low temperatures
Masaru Sato, Hideki Kitada, Mayumi B. Takeyama (kitami inst. of tech.)

----- Break ( 15 min. ) -----

(10) 10:45 - 11:05
Evaluation of rear surface passivation layer deposited by wet process
Ryosuke Watanabe (Hirosaki Univ.), Tsubasa Koyama, Yoji Saito (Seikei Univ.)

(11) 11:05 - 11:25
Reduction reaction of SiO2 layer on Si substrate by irradiation of electron beam
Keisuke Fujimori, Yosuke Chida, Yusuke Masuda, Natsuki Ujiie, Yoshiharu Enta (Hirosaki Univ.)

(12) 11:25 - 11:45
Surface composition and chemical bond structure of Zr-based metallic glass
Haruto Koriyama, Keisuke Fujimori, Yoshiharu Enta (Hirosaki Univ.), Nozomu Togashi (Adamant Namiki Precision Jewel)

# Information for speakers
General Talk will have 15 minutes for presentation and 5 minutes for discussion.

# CONFERENCE SPONSORS:
- This conference is co-sponsored by Department of Electronics and Information Technology, Hirosaki University


=== Technical Committee on Component Parts and Materials (CPM) ===
# FUTURE SCHEDULE:

Thu, Aug 23, 2018 - Fri, Aug 24, 2018: Otaru Camber of Commerce & Industry [Fri, Jun 15]
Wed, Oct 3, 2018: Kikai-Shinko-Kaikan Bldg. [Mon, Aug 6]
Thu, Nov 1, 2018 - Fri, Nov 2, 2018: Machinaka campus Nagaoka [Fri, Sep 14], Topics: Functional materials (semiconductors, magnetic materials, dielectric materials, transparent conductors, semiconductors, etc.) Thin film processes / materials / devices, etc.
Wed, Nov 21, 2018 - Thu, Nov 22, 2018 (tentative): Kikai-Shinko-Kaikan Bldg. [Wed, Sep 19], Topics: Energy,Device, Battery, others
Thu, Nov 29, 2018 - Fri, Nov 30, 2018: Nagoya Inst. tech. [Thu, Sep 13], Topics: Nitride Semiconductor Devices, Materials, Related Technologies


Last modified: 2018-06-16 10:40:47


Notification: Mail addresses are partially hidden against SPAM.

[Download Paper's Information (in Japanese)] <-- Press download button after click here.
 
[Cover and Index of IEICE Technical Report by Issue]
 

[Presentation and Participation FAQ] (in Japanese)
 

[Return to CPM Schedule Page]   /  
 
 Go Top  Go Back   Prev CPM Conf / Next CPM Conf [HTML] / [HTML(simple)] / [TEXT]  [Japanese] / [English] 


[Return to Top Page]

[Return to IEICE Web Page]


The Institute of Electronics, Information and Communication Engineers (IEICE), Japan