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Technical Committee on Organic Molecular Electronics (OME)
Chair: Keizo Kato (Niigata Univ.) Vice Chair: Naoki Matsuda (AIST)
Secretary: Kiyoshi Takimoto (Canon Electronics), Tatsuo Mori (Aichi Inst. of Tech.)
Assistant: Akihiro Kohno (NTT), Shinichiro Inoue (NICT)

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Technical Committee on Silicon Device and Materials (SDM)
Chair: Yuzou Oono (Univ. of Tsukuba) Vice Chair: Tatsuya Kunikiyo (Renesas)
Secretary: Rihito Kuroda (Tohoku Univ.)
Assistant: Tadashi Yamaguchi (Renesas)

DATE:
Wed, Apr 29, 2015 12:50 - 18:10
Thu, Apr 30, 2015 10:00 - 15:20

PLACE:
Ohama Memorial Hall(2-70, Tonoshiro, Ishigakishi, Okinawa. http://ohamanobumoto.com/. AIST Kyushu. 0942813623)

TOPICS:
Thin FIlms, Functional Electronics Devices, New Functional Materials and Evaluation, BIomtechnology

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Wed, Apr 29 PM (12:50 - 18:10)
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(1) 12:50 - 13:15
In Situ Observation of Direct Electron Transfer Reaction of Cytochrome c Immobilized on ITO Electrode Modified with Phosphoric Acid Compounds by Slab Optical Waveguide Spectroscopy
Naoki Matsuda, Hirotaka Okabe, Toshihiko Nagamura (AIST)

(2) 13:15 - 13:40
Chemical modification of diamond powder with optically active functionalities and its chiral recognition behavior
Takako Nakamura, Tsuguyori Ohana, Tetsuo Tsuchiya (AIST), Toshiki Tsubota (Kyushu Inst. Tech.)

(3) 13:40 - 14:05
Coordination chemistry of active center of metalloenzyme studied by affinity capillary electrophoresis
Nobuhiko Iki, Yosuke Sato (Tohoku Univ.)

(4) 14:05 - 14:30
Glycolytic oscillations and their synchronization in yeast cells encapsulated in microparticles
Takashi Amemiya, Kouhei Obase, Naoki Hiramatsu (YNU), Kenichi Shibata (Toyo Univ), Kiminori Itoh (YNU)

(5) 14:30 - 15:10
[Invited Talk]
Design and its functionality of nano medicine
Yukio Nagasaki (Univ.Tsukuba)

----- Break ( 10 min. ) -----

(6) 15:20 - 15:45
High Refractive Index and High Abbe Number Hybrid Material
Okihiro Sugihara (Utsunomiya Univ.), Bin Cai (Univ. Shanghai Sci. Tech.), Toshikuni Kaino (Tohoku Univ.)

(7) 15:45 - 16:25
[Invited Talk]
Photochemical up-conversion by non-coherent light and utilization of surface plasmon resonance
Toshihiko Nagamura (AIST, Kitakyushu Col. Technol.), Kenji Takehara, Hirokazu Yamane (Kitakyushu Col. Technol.), Hideki Kawai (Shizuoka Univ.), Naoki Matsuda (AIST)

(8) 16:25 - 17:05
[Invited Talk]
Suppression of light induced degradation of a-Si solar cells by eliminating clusters
Masaharu Shiratani, Susumu Toko, Yoshihiro Torigoe, Kimitaka Keya, Kazunori Koga (Kyushu Univ.)

(9) 17:05 - 17:30
Effect of fluorine in In-Ga-Zn-O on defect passivartion and reliability of thin-film transistors
Mamoru Furuta, Jingxin Jiang, Gengo Tatsuoka, Dapeng Wang (Kochi Univ. of Tech.)

(10) 17:30 - 18:10
Low Coefficient of Thermal Expansion Polyimide Film for Flexible Device Substrate.
Tetsuo Okuyama (TOYOBO)

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Thu, Apr 30 AM (10:00 - 15:20)
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(11) 10:00 - 10:40
[Invited Talk]
Formation of high Sn content SiSn films and its band structure
-- Aiming for direct-band-gap semiconductor --
Masashi Kurosawa, Wakana Takeuchi, Mitsuo Sakashita, Osamu Nakatsuka, Shigeaki Zaima (Nagoya Univ.)

(12) 10:40 - 11:05
Lateral solid-phase crystallization of a-GeSn on insulator for next generation flexible electronics
Ryo Matsumura (Kyushu Univ./ JSPS), Hironori Chikita, Yuki Kai, Masaya Sasaki, Taizoh Sadoh, Hiroshi Ikenoue, Masanobu Miyao (Kyushu Univ.)

(13) 11:05 - 11:30
Influence of TEOS-SiO2 cap layer on Au induced lateral crystallization for amorphous Ge on insulator
Kazuki Kudo, Kinta Kusano, Takatsugu Sakai (KNCT), Shinichi Motoyama, Yutaka Kusuda, Masahiro Furuta (SAMCO), Nobuyuki Naka, Tomoko Numata (HORIBA), Kenichiro Takakura, Isao Tsunoda (KNCT)

(14) 11:30 - 11:55
Low temperature formation of orientation controlled crystalline Ge/Au/insulator stacked structure
Tatsushi Nomitsu, Hayato Okamoto, Kohei Kudo, Taisei Sakaguchi, Kenichiro Takakura, Isao Tsunoda (KNCT)

----- Break ( 65 min. ) -----

(15) 13:00 - 13:25
Grain Growth Control by Atmospheric Pressure Micro-Thermal-Plasma-Jet Irradiation on Amorphous Silicon Strips and High-Speed Operation of CMOS Circuit
Seiji Morisaki, Shohei Hayashi, Shogo Yamamoto, Taichi Nakatani, Seiichiro Higashi (Hiroshima Univ.)

(16) 13:25 - 13:50
Temperature Analysis of Si Films during Blue Multi-Laser Diode Annealing
Tatsuya Okada, Seita Kamimura, Takashi Noguchi (Univ. Ryukyus)

(17) 13:50 - 14:15
Low Resistivity of poly-Si films by LA Laser Annealing
Takashi Noguchi, Tatsuya Okada (Univ. Ryukyus)

(18) 14:15 - 14:40
Self-Aligned Four-Terminal Planar Metal Double-Gate CLC LT Poly-Si TFTs on Glass Substrate
Hiroki Ohsawa, Shun Sasaki, Akito Hara (Tohoku Gakuin Univ.)

(19) 14:40 - 15:20
[Tutorial Lecture]
An introduction to Corning's Advanced Glass Technologies
Taketsugu Itoh (Corning)

# Information for speakers
General Talk will have 20 minutes for presentation and 5 minutes for discussion.
Invited Talk will have 35 minutes for presentation and 5 minutes for discussion.
Tutorial Lecture will have 35 minutes for presentation and 5 minutes for discussion.

# CONFERENCE SPONSORS:
- This conference is co-sponsored by The Japan Society of Applied Physics.

=== Technical Committee on Organic Molecular Electronics (OME) ===
# FUTURE SCHEDULE:

Fri, May 29, 2015: Kikai-Shinko-Kaikan Bldg [Tue, Mar 31], Topics: Organic Electronics Device, Biotechnolpgy, et al.
Fri, Jun 19, 2015: Kikai-Shinko-Kaikan Bldg. [Thu, Apr 9]
Wed, Jul 29, 2015: Univ. of Toyama [Tue, May 19], Topics: Organic Thin Film, Organic Devices, etc.

=== Technical Committee on Silicon Device and Materials (SDM) ===
# FUTURE SCHEDULE:

Thu, May 28, 2015 - Fri, May 29, 2015: Venture Business Laboratory, Toyohashi University of Technology [Tue, Mar 24], Topics: crystal growth、devices characterization , etc.
Fri, Jun 19, 2015: VBL, Nagoya Univ. [Thu, Apr 9], Topics: Material Science and Process Technology for MOS Devices and Memories

# SECRETARY:
Rihito Kuroda(Tohoku Univ.)
Tel 022-795-4833 Fax 022-795-4834
E-mail: