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Technical Committee on Component Parts and Materials (CPM)
Chair: Kiyoshi Ishii Vice Chair: Kiichi Kamimura
Secretary: Toru Matsuura, Seiji Toyoda
Assistant: Hidehiko Shimizu, Yasushi Takemura

DATE:
Mon, Aug 7, 2006 13:30 - 17:05
Tue, Aug 8, 2006 09:30 - 12:40

PLACE:
Faculty of Engineering, Iwate University(4-3-5, Ueda, Morioka, Iwate 020-8550 JAPAN. http://www.iwate-u.ac.jp/english/campusmap/index.html. Faculty of Engineering, Iwate University, Prof. Osamu Michikami. 019-621-6386)

TOPICS:
Electronic Component Parts and Materials, etc.

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Mon, Aug 7 PM (13:30 - 17:05)
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(1) 13:30 - 13:55
Ga content dependence of properties of ZnO:Ga thin film prepared on glass substrate by rf magnetron sputtering
Norimitu Nasu, Hiroaki Hasebe, Kouichi Mutou, Shinji Kikuchi, Osamu Michikami (Iwate Univ.)

(2) 13:55 - 14:20
Growth of Ga doped ZnO films by RF sputterring in ambient Ar+H2
Kouichi Mutou, Norimitu Nasu, Hiroaki Hasebe, Osamu Michikami (Iwate Univ.)

(3) 14:20 - 14:45
ZnO thin film growth on Si(100) by MOCVD
Hisao Wajima, Fumihiko Hirose (Yamagata Univ.)

(4) 14:45 - 15:10
Preparation and consideration of ZnO Thin Films Deposited by Sputter-Beam Deposition Method
Toru Noguchi, Ayumu Kawakami, Akiyuki Higashide, Hidehiko Shimizu, Takeo Maruyama, Haruo Iwano, Takahiro Kawakami (Niigata Univ.), Yoichi Hoshi (T.P.U.)

----- Break ( 15 min. ) -----

(5) 15:25 - 15:50
Low temperature deposition of anatase poly TiO2 by chemical vapor deposition
Fumihiko Hirose, Masashi Ito, Yu Matsushima (YU)

(6) 15:50 - 16:15
High Rate deposition of TiO2 thin films by plasma assisted electron beam evaporation
Yoichi Hoshi, Shigetoshi Kawaguchi, Osamu Kamiya (Tokyo Polytechnic Univ.), Hidehiko Shimizu (Niigata Univ.)

(7) 16:15 - 16:40
Low temperature epitaxial growth of 3C-SiC on SOI substrate using Hot-Mesh CVD method
Hitoshi Miura, Taishi Kurimoto, Yuichiro Kuroki, Kanji Yasui, Masasuke Takata, Tadashi Akahane (Nagaoka Univ. of Tech.)

(8) 16:40 - 17:05
Growth of GaN on SiC/Si(111) substrates using AlN buffer layer by hot-mesh CVD method
Kazuyuki Tamura, Yusuke Fukada, Yuichiro Kuroki, Masasuke Takata, Kanji Yasui, Tadashi Akahane (Nagaoka Univ. of Tech)

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Tue, Aug 8 AM (09:30 - 12:40)
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(9) 09:30 - 09:55
EuBa2Cu3O7-δ薄膜用CeO2バッファ層の厚膜化
Keita Kikuchi, Jun Sakuma, Satosi Husiwara, Yasuyuki Ota, Osamu Michikami (Iwate Univ.)

(10) 09:55 - 10:20
The control of the surface morphology of thick CeO2 buffer layer prepared by magnetron sputtering
Yasuyuki Ota, Jun Sakuma, Yutaka Kimura, Hiroshi Mashiko, Osamu Michikami (Iwate Univ.)

(11) 10:20 - 10:45
Superconducting properties of EuBa2Cu3O7-d thin films grown on thick Sm2O3 buffer layers
Yutaka Kimura, Yasuyuki Ota, Yuya Unuma, Osamu Michikami (Iwate Univ.)

(12) 10:45 - 11:10
The effect of heat treatment on a large sized superconducting thin film using the facing targets magnetron suputtering method
Shingo Musashi, Iori Hayasaka, Kouya Takahashi, Osamu Michikami (Iwate Univ)

----- Break ( 15 min. ) -----

(13) 11:25 - 11:50
Deposition of Large-area SmBa2Cu3O7-δ films by Magnetron Sputtering with Facing Targets
Koya Takahashi, Shingo Musashi, Yutaka Kimura, Shinji Kikuchi, Osamu Michikami (Iwate Univ.)

(14) 11:50 - 12:15
Electro-magnetic Wave Absorption Characteristics due to Structure of the Powder-Type Magnetic Wood(4)
Koji Sato, Hideo Oka (Iwate Univ.), Yasuji Namizaki (Iwate Industrial Research Insti.)

(15) 12:15 - 12:40
A bowl-shaped left handed material lens
Takakazu Yonezawa, Masahiro Daibo, Norio Tayama (Iwate Univ.)

# Information for speakers
General Talk will have 20 minutes for presentation and 5 minutes for discussion.


=== Technical Committee on Component Parts and Materials (CPM) ===
# FUTURE SCHEDULE:

Thu, Aug 24, 2006 - Fri, Aug 25, 2006: Chitose Arcadia Plaza [Fri, Jun 16]
Fri, Sep 15, 2006: Kikai-Shinko-Kaikan Bldg. [Tue, Jul 18]
Thu, Oct 5, 2006 - Fri, Oct 6, 2006: [Thu, Jul 27]
Thu, Nov 9, 2006 - Fri, Nov 10, 2006: Kanazawa Univ. [Thu, Sep 21], Topics: Process of Thin Film formation and Materials, etc.

# SECRETARY:
Hidehiko Shimizu (Niigata University)
TEL 025-262-6811, FAX 025-262-6811
E-mail: engi-u

Osamu Michikami (Iwate University)
TEL 019-621-6386, FAX 019-621-6393
E-mail: mi-u


Last modified: 2006-05-30 18:52:58


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