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Technical Committee on Component Parts and Materials (CPM)
Chair: Satoru Noge (Numazu National College of Tech.) Vice Chair: Fumihiko Hirose (Yamagata Univ.)
Secretary: Junichi Kodate (NTT), Nobuyuki Iwata (Nihon Univ.)
Assistant: Takashi Sakamoto (NTT), Yuichi Nakamura (Toyohashi Univ. of Tech.)
DATE:
Mon, Aug 10, 2015 13:20 - 17:00
Tue, Aug 11, 2015 09:40 - 12:00
PLACE:
TOPICS:
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Mon, Aug 10 PM (13:20 - 17:00)
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(1) 13:20 - 13:40
Preparation and characterization of SiC thin films on AlN/Si(110) substrates by pulsed laser deposition
Kazuki Meguro, Shunki Narita, Hideki Nakazawa (Hirosaki Univ.)
(2) 13:40 - 14:00
Effects of substrate bias on properties of nitrogen-doped DLC films prepared by radio frequency plasma-enhanced chemical vapor deposition
Masato Tsuchiya, Kazuki Murakami, Tatsuhito Satou, Takahiro Takami, Yoshiharu Enta, Hideki Nakazawa (Hirosaki Univ.)
(3) 14:00 - 14:20
Growth of epitaxial SiC thin films on AlN/Si(110) substrates by pulsed laser deposition
Shunki Narita, Kazuki Meguro, Hideki Nakazawa (Hirosaki Univ.)
----- Break ( 20 min. ) -----
(4) 14:40 - 15:00
Low temperature deposition of SiNx films as an insulating barrier
Mayumi B. Takeyama, Masaru Sato (Kitami Inst. of Technol.), Yasushi Kobayashi, Yoshihiro Nakata, Tomoji Nakamura (Fujitsu Lab.), Atsushi Noya (Kitami Inst. of Technol.)
(5) 15:00 - 15:20
Preparation of SnS thin film by chemical bath deposition using a flow cell
Ryo Hayakawa, Yasushi Takano, Akihiro Ishida (Shizuoka Univ.)
(6) 15:20 - 15:40
Properties of oxide thermoelectric thick films fabricated by aerosol deposition method.
Katsunori Shirai, Koyuki Shirai, Yuichi Nakamura, Mitsuteru Inoue (TUT)
----- Break ( 20 min. ) -----
(7) 16:00 - 16:20
Electric and Magnetic Properties of [CaFeOx/LaFeO3] Artificial Superlattice
Shohei Ohashi, Keisuke Oshima, Yuta Watabe, Takaaki Inaba, Chun Wang, Qi Zhang, Hirotaka Matsuyama, Kouichi Takase, Takuya Hashimoto, Tomoko Nagata, Huaping Song, Hiroshi Yamamoto, Nobuyuki Iwata (Nihon Univ.)
(8) 16:20 - 16:40
Electric Properties of BiFe1-xMnxO3 Thin Films and CaFeOx/BiFe1-xMnxO3 Superlattices
Takaaki Inaba, Yuta Watabe, Keisuke Oshima, Chun Wang, Huaping Song, Shohei Ohashi, Oi Chang, Kouichi Takase, Takuya Hashimoto, Tomoko Nagata, Hiroshi Yamamoto, Nobuyuki Iwata (Nihon Univ.)
(9) 16:40 - 17:00
Effect of Free Electron Laser Irradiation in Chirality Control of Single-Walled Carbon Nanotubes
Keisuke Yoshida, Daiki Kawaguchi, Miu Kobayashi, Shinnosuke Harumiya, Tomoko Nagata, Hiroshi Yamamoto, Nobuyuki Iwata (Nihon Univ.)
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Tue, Aug 11 AM (09:40 - 12:00)
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(10) 09:40 - 10:00
Low temperature deposition of HfNx film by radical reaction
Masaru Sato, Mayumi B. Takeyama, Atsushi Noya (Kitami inst. of Technol.)
(11) 10:00 - 10:20
Formation of high density Ge-nanodots on SOI substrates
-- Aiming at enhancement of emission from Ge-nanodots using photonic crystal --
Makoto Morioka, Koudai Watanabe, Masataka Tomita, Hideyuki Toyota, Ariyuki Kato, Yasuhiro Tamayama, Toshio Kanbayashi, Kanji Yasui (Nagaona Univ. Technol.)
(12) 10:20 - 10:40
Study of the Ce: YIG Thin Film Growth by Using Contact Epitaxy Method for Integrated Optical Isolator
Satoru Noge (NIT, Numazu College), Masato Seido, Masayuki Takeda, Katsumi Nakatsuhara (KAIT)
----- Break ( 20 min. ) -----
(13) 11:00 - 11:20
Metal oxide coating on PET bottles using room temperature atomic layer deposition
Fumihiko Hirose, Kensaku Kanomata, Bashir Ahamad, Shigeru Kubota (Yamagata Univ)
(14) 11:20 - 11:40
Evaluation of interface and near-interface traps in Al-germanate/Ge structure fabricated by Radical-Enhanced ALD
Hidefumi Narita (Hirosaki Univ.), Daichi Yamada, Yukio Fukuda (Tokyo Univ. of Science, Suwa), Yosuke Kanuka, Hiroshi Okamoto (Hirosaki Univ.)
(15) 11:40 - 12:00
Effect of surface adsorbate on chemical shifts of core-level spectra for silicon oxinitride film
Takahiro Takami, Makoto Wada, Yoshiharu Enta (Hirosaki Univ.)
# Information for speakers
General Talk will have 14 minutes for presentation and 6 minutes for discussion.
=== Technical Committee on Component Parts and Materials (CPM) ===
# FUTURE SCHEDULE:
Thu, Aug 27, 2015 - Fri, Aug 28, 2015: Aomori-Bussankan-Asupamu [Mon, Jun 15]
Wed, Oct 14, 2015: Kikai-Shinko-Kaikan Bldg. [Fri, Jul 24]
Fri, Nov 6, 2015 - Sat, Nov 7, 2015: Machinaka Campus Nagaoka [Fri, Sep 11], Topics: Thin film processing, etc.
Thu, Nov 26, 2015 - Fri, Nov 27, 2015: Osaka City University Media Center [Wed, Sep 16], Topics: Nitride Semiconductor Devices, Materials, Related Technologies
Last modified: 2015-06-27 22:31:35
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