Fri, Apr 27 PM
13:00 - 17:30 |
| (1) |
13:00-13:30 |
[Invited Talk]
Development of Organic Photovoltaic Cell Based on Small Molecules |
Tetsuya Taima (kanazawa Univ.) |
| (2) |
13:30-14:00 |
[Invited Talk]
Preparation of Organic-Inorganic Hybrid Materials and Photonic Applications |
Okihiro Sugihara (Tohoku Univ.) |
| (3) |
14:00-14:20 |
Fabrication and Performance of Organic Solar Cells Using Hole-transporting Amorphous Molecular Materials with High Charge Carrier Mobility |
Hiroshi Kageyama (Univ. Ryukyus), Yutaka Ohmori (Osaka Univ.), Yasuhiko Shirota (Fukui Univ. Technol.) |
| (4) |
14:20-14:40 |
In situ observation of adsorption process and functionality of cytochrome c on solid/liquid interfaces
-- Slab optical waveguide absorption spectroscopy in UV-visible region -- |
Naoki Matsuda, Hirotaka Okabe (AIST) |
| (5) |
14:40-15:00 |
Effects of Guided Filament Formation in NiO-ReRAM Utilizing Bio Nano Process
-- Control of defects in thin films -- |
Mutsunori Uenuma, Takahiko Ban, Zheng Bin, Ichiro Yamashita, Yukiharu Uraoka (NAIST) |
| |
15:00-15:10 |
Break ( 10 min. ) |
| (6) |
15:10-15:40 |
[Invited Talk]
Growth of Silicon and Silicon-Germanium Thin Films on Glass Substrates by Continuous-Wave Laser Lateral Crystallization |
Kuninori Kitahara (Shimane Univ.), Akito Hara (Tohoku Gakuin Univ.) |
| (7) |
15:40-16:10 |
[Invited Talk]
Formation of Biaxially-Oriented Poly-Si Thin Films by Double-Line Beam Continuous-Wave Laser Lateral Crystallization for High-Performance TFT |
Shin-Ichiro Kuroki (Tohoku Univ.) |
| (8) |
16:10-16:30 |
Control of Crystallization Behavior of Silicon Thin Films by Semiconductor Blue-Multi-Diode-Laser Annealing |
Katsuya Shirai, Jean de Dieu Mugiraneza, Toshiharu Suzuki, Tatsuya Okada, Takashi Noguchi (Univ. of the Ryukyus), Hideki Matsushima, Takao Hashimoto, Yoshiaki Ogino, Eiji Sahota (Hitachi CP) |
| (9) |
16:30-16:50 |
Crystallization of Si Thin Film on Poly-Imide Substrate by Semiconductor Blue Multi-Laser Diode Annealing |
Tatsuya Okada, Jean de Dieu Mugiraneza, Katsuya Shirai, Toshiharu Suzuki, Takashi Noguchi (Univ. Ryukyus), Hideki Matsushima, Takao Hashimoto, Yoshiaki Ogino, Eiji Sahota (Hitachi CP) |
| (10) |
16:50-17:10 |
Self-Aligned Planar Metal Double-Gate Polycrystalline-Silicon Thin-Film Transistors Fabricated at Low Temperature on Glass Substrate |
Hiroyuki Ogata, Kenji Ichijo, Kenji Kondo, Yasunori Okabe, Yusuke Shika, Shinya Kamo, Akito Hara (Tohoku Gakuin Univ.) |
| (11) |
17:10-17:30 |
Bottom Gate TFT using Low Temperature Deposited Nanocrystalline-Si |
Asuka Syuku, Eiji Takahashi, Yasunori Andoh (Nissin Electric) |
Sat, Apr 28 AM
09:00 - 12:10 |
| (12) |
09:00-09:30 |
[Invited Talk]
Low-Temperature Crystallization of Amorphous Semiconductor Films Using Only Soft X-ray Irradiation |
Naoto Matsuo, Akira Heya, Takayasu Mochizuki, Shuji Miyamoto, Kazuhiro Kanda (Univ Hyogo) |
| (13) |
09:30-10:00 |
[Invited Talk]
Excimer laser induced super lateral growth of a-Ge film |
Wenchang Yeh (Shimane Univ.) |
| (14) |
10:00-10:20 |
Seed-less melting growth of Ge(Si) on Insulator
-- Large grain formation by Si segregation -- |
Ryusuke Kato, Masashi Kurosawa, Hiroyuki Yokoyama, Taizoh Sadoh, Masanobu Miyao (Kyushu Univ.) |
| (15) |
10:20-10:40 |
Epitaxial Growth of Silicon Films on Porous Silicon Underlayer by Micro-Thermal-Plasma-Jet Irradiation |
Shohei Hayashi, Ryohei Matsubara, Yuji Fujita, Mitsuhisa Ikeda, Seiichiro Higashi (Hiroshima Univ.) |
| |
10:40-10:50 |
Break ( 10 min. ) |
| (16) |
10:50-11:10 |
Control of Grain Growth Using Amorphous Si Strips and Slit Masks Induced by Micro-Thermal-Plasma-Jet Crystallization |
Yuji Fujita, Shohei Hayashi, Seiichiro Higashi (Hiroshima Univ.) |
| (17) |
11:10-11:30 |
Orientation-Controlled Large-Grain Ge on Insulator by Au-Induced Layer Exchange Crystallization with Interfacial Oxide Layer |
Tsuneharu Suzuki, Jong-Hyeok Park, Masashi Kurosawa, Masanobu Miyao, Taizoh Sadoh (Kyushu Univ.) |
| (18) |
11:30-11:50 |
Electrical Characterization of SiO2 and SiN Films Deposited by RF Sputtering |
Keisuke Yagi, Tatsuya Okada, Takashi Noguchi (Univ.Ryukyus) |
| (19) |
11:50-12:10 |
Crystallization of the Sputtered P-doped Si Films for High Performance Poly-Si TFT |
Takuma Nishinohara, J. D. Mugiraneza, Katsuya Shirai, Toshiharu Suzuki, Tatsuya Okada, Takashi Noguchi (Univ. of the Ryukyus), Tadashi Ohachi (Doshisha Univ.), Hideki Matsushima, Takao Hashimoto, Yoshiaki Ogino, Eiji Sahota (Hitachi CP) |
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