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Technical Committee on Component Parts and Materials (CPM)
Chair: Kanji Yasui (Nagaoka Univ. of Tech.) Vice Chair: Yasushi Takemura (Yokohama National Univ.)
Secretary: Tadayuki Imai (NTT), Satoru Noge (Numazu National College of Tech.)
Assistant: Toshishige Shimamura (NTT), Katsuya Abe (Shinshu Univ.)
DATE:
Thu, Jul 29, 2010 13:30 - 16:40
Fri, Jul 30, 2010 09:30 - 12:10
PLACE:
TOPICS:
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Thu, Jul 29 PM (13:30 - 16:40)
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(1) 13:30 - 13:55
Fabrication of CuInO2 thin films using RF sputtering and studies of annealing effects
Tsubasa Ogawa, Takuya Yokomoto, Rinpei Hayashibe, Tomohiko Yamakami, Katsuya Abe (Shinshu Univ.)
(2) 13:55 - 14:20
Growth of Fe3O4/GaAs Epitaxial Thin Films by Gas Flow Sputtering
Hiroshi Sakuma, Yuki Shidara, Yasuhito Kagi, Ryo Suzuki, Kiyoshi Ishii (Utsunomiya Univ.)
(3) 14:20 - 14:45
Characteristic of AZO thin films deposited at room temperature by sputtering method
Hidehiko Shimizu, Jun Kashiide, Haruo Iwano, Takahiro Kawakami, Yasuo Fukushima, Kotaro Nagata (Niigata Univ.), Yoichi Hoshi (Tokyo Polytechnic Univ.)
----- Break ( 10 min. ) -----
(4) 14:55 - 15:20
Epitaxial growth of ZnO films using hot water molecules generated by catalytic reaction
Masami Tahara, Hitoshi Miura, Tomoyoshi Kuroda, Hiroshi Nishiyama, Kanji Yasui (Nagoka Univ. of Tech.)
(5) 15:20 - 15:45
Proposal and Experimental Evaluation of A Novel Method for Eye-Pattern Improvement on Transmission Lines
Masami Ishiguro, Yuki Shimauchi, Noriyuki Aibe (Tsukuba Univ.), Ikuo Yoshihara (Miyazaki Univ.), Moritoshi Yasunaga (Tsukuba Univ.)
----- Break ( 5 min. ) -----
(6) 15:50 - 16:40
[Invited Talk]
Science in porosity engineering of low-k dielectrics using supercritical carbon dioxide
-- Pore characterization and pore cleaning --
Eiichi Kondoh (Univ. of Yamanashi.)
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Fri, Jul 30 AM (09:30 - 12:10)
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(7) 09:30 - 09:55
Low temperature of deposition of ZrNx film using radical reaction
Masaru Sato, Mayumi B. Takeyama (kitami Inst. of Tech.), Yuichiro Hayasaka, Eiji Aoyagi (Tohoku Univ.), Atsushi Noya (kitami Inst. of Tech.)
(8) 09:55 - 10:20
Atomic layer deposition (ALD) of vanadium nitride films using TDEAV
Mayumi B. Takeyama, Masaru Sato (kitami Inst. of Tech.), Hiroshi Sudoh, Hideaki Machida (Gas-phase Growth Ltd.), Shun Ito, Eiji Aoyagi (Tohoku Univ.), Atsushi Noya (kitami inst. of tech.)
(9) 10:20 - 10:45
Formation of AlN films on Si substrate by Pulsed Laser Deposition
Hideki Nakazawa, Daiki Suzuki, Ryoichi Osozawa, Hiroshi Okamoto (Hirosaki Univ.)
----- Break ( 10 min. ) -----
(10) 10:55 - 11:20
Field Emission from Horizontally Aligned Carbon Nanotube
Hirofumi Saito, Tomohiko Yamakami, Rinpei Hayashibe, Takumi Ooike, Masahiro Yamashita, Kiichi Kamimura (Shinshu Univ.)
(11) 11:20 - 11:45
Photo-Assisted Polymerization of C60 Synthesized by Liquid-Liquid-Interfacial Precipitation Method
Daiki Koide, Shota Katou, Eri Ikeda, Nobuyuki Iwata, Hiroshi Yamamoto (Nihon Univ.)
(12) 11:45 - 12:10
Characteristics of Visible Light Emission from Sn-doped SiO2 Thin Films by UV Irradiation
Shota Mochizuki, Satoru Noge (Numazu Nat Coll. of Tech.)
# Information for speakers
General Talk will have 20 minutes for presentation and 5 minutes for discussion.
Invited Talk will have 40 minutes for presentation and 10 minutes for discussion.
=== Technical Committee on Component Parts and Materials (CPM) ===
# FUTURE SCHEDULE:
Thu, Aug 26, 2010 - Fri, Aug 27, 2010: Chitose Arcadia Plaza [Wed, Jun 16]
Fri, Sep 10, 2010: Kikai-Shinko-Kaikan Bldg [Fri, Jul 16], Topics: Optical Data Storage, Electronic Materials, etc.
Thu, Oct 28, 2010 - Fri, Oct 29, 2010: [Mon, Aug 23]
Last modified: 2010-06-24 09:15:46
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