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岩井 洋 | ||
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[ 1] H. Iwai, M. R. Pinto, C. S. Raffrety, J. E. Oristian, and R. W. Dutton, "Analysis of velocity saturation and other effects on short channel MOS transistor capacitances," IEEE Trans. Computer-Aided Design, vol.6, pp.173-184 ,1987 [ 2] H. Iwai, T. Ohguro, and H. Ohmi, “NiSi salicide technology for scaled CMOS”, Microelectronic Engineering 60, pp.157-169, February 2002 [ 3] H.Iwai, “CMOS downsizing toward sub-10nm”, SolidState Electronics 48, pp.497-503, September 2003 |
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