Summary

Proceedings of the 2013 International Symposium on Nonlinear Theory and its Applications

2013

Session Number:C4L-D

Session:

Number:499

Multiscale Surface Roughness Measure for Dressed-Photon-Phonon Etching

Makoto Naruse,  Takashi Yatsui,  Wataru Nomura,  Tadashi Kawazoe,  Masaki Aida,  Motoichi Ohtsu,  

pp.499-502

Publication Date:

Online ISSN:2188-5079

DOI:10.15248/proc.2.499

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Summary:
Dressed-photon-phonon (DPP) etching is a disruptive technology in planarizing material surfaces because it completely eliminates mechanical contact processes. However, adequate metrics for evaluating the surface roughness and the underlying physical mechanisms are still not well understood. Here we propose a two-dimensional multiscale surface roughness measure that represents the effectiveness of DPP etching while conserving the original two-dimensional surface topology. Also, we created a simple physical model of DPP etching that agrees well with the experimental observations, which clearly shows the involvement of the intrinsic multiscale properties of dressed photons, or optical near-fields, in the surface processing.

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