Presentation 2015-03-20
How to Design Scanning Resolution in Artifact-metrics
Takuya IWAYOSHI, Naoki YOSHIDA, Tsutomu MATSUMOTO,
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Abstract(in English) Artifact-metrics is a security technology which authenticates individual artifacts based on intrinsic unique features which reproduction is even difficult by manufacturer. But authentication accuracies and the reproduction difficulty rely on not only artifact unique features but also how to design a metric system which measures artifacts and authenticates them. Thus we have a hypothesis that artifact-metrics systems should have sufficient scanning resolution to discriminate a presented artifact is genuine or cloned. This article proves this hypothesis in a paper artifact-metric system using visible-light scanning.
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Keyword(in English) Security / Paper / Artifact-metrics / MFP / Resolution
Paper # BioX2014-62,PRMU2014-182
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Conference Information
Committee PRMU
Conference Date 2015/3/12(1days)
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Paper Information
Registration To Pattern Recognition and Media Understanding (PRMU)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) How to Design Scanning Resolution in Artifact-metrics
Sub Title (in English)
Keyword(1) Security
Keyword(2) Paper
Keyword(3) Artifact-metrics
Keyword(4) MFP
Keyword(5) Resolution
1st Author's Name Takuya IWAYOSHI
1st Author's Affiliation Graduate School of Environment and Information Sciences, Yokohama National University()
2nd Author's Name Naoki YOSHIDA
2nd Author's Affiliation Graduate School of Environment and Information Sciences, Yokohama National University
3rd Author's Name Tsutomu MATSUMOTO
3rd Author's Affiliation Graduate School of Environment and Information Sciences, Yokohama National University
Date 2015-03-20
Paper # BioX2014-62,PRMU2014-182
Volume (vol) vol.114
Number (no) 521
Page pp.pp.-
#Pages 6
Date of Issue