Presentation 2015-03-03
Methodology for Reduction of Timing Margin by Considering Correlation between Process Variation and BTI
Michitarou YABUUCHI, Kazutoshi KOBAYASHI,
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Abstract(in English) We analyze the efficiency of the design methodology by using circuit simulations. The design methodology which considers the correlation between process variations and BTI (Bias Temperature Instability)-induced degradations reduces timing margins of circuits without threatening their reliability. Because the reliability issues become significant problems in the heavily scaled process, circuit designers should consider them. The reliable design methodology for high performance circuits is required. There is the correlation between process variations and BTI-induced degradations. The degradation rates of MOSFETs which have low initial threshold voltages are lower than the other variation conditions. We propose the design methodology which considering the correlation and analyze its efficiency for circuit designs. We confirm the timing margins are reduced by 10% with our methodology.
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Keyword(in English) BTI / process variation / reliability / degradation prediction
Paper # VLD2014-163
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Committee VLD
Conference Date 2015/2/23(1days)
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Registration To VLSI Design Technologies (VLD)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Methodology for Reduction of Timing Margin by Considering Correlation between Process Variation and BTI
Sub Title (in English)
Keyword(1) BTI
Keyword(2) process variation
Keyword(3) reliability
Keyword(4) degradation prediction
1st Author's Name Michitarou YABUUCHI
1st Author's Affiliation Graduate School of Science and Technology, Kyoto Institute of Technology()
2nd Author's Name Kazutoshi KOBAYASHI
2nd Author's Affiliation Graduate School of Science and Technology, Kyoto Institute of Technology
Date 2015-03-03
Paper # VLD2014-163
Volume (vol) vol.114
Number (no) 476
Page pp.pp.-
#Pages 6
Date of Issue