| Presentation | 2015-03-02 A cut-pattern reduction method for routing in Self-Aligned Double Patterning Noriyuki TAKAHASHI, Takeshi IHARA, Atsushi TAKAHASHI, |
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| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | In Self-Aligned Double Patterning (SADP), a routing method that generates a SADP friendly routing pattern efficiently by using two-color base grid was proposed. A routing pattern can be realized without trim mask if a special pattern called cut-pattern is used in a pattern mask of SADP. However the reliability of a wafer image is expected to be reduced if the number of cut-patterns used increases. In this paper, we propose a routing method that realizes a routing pattern with less cut-patterns by using two-color base grid. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | Self-Aligned Double Patterning (SADP) / Two-color base grid / Mask / Cut-Pattern |
| Paper # | VLD2014-154 |
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| Conference Information | |
| Committee | VLD |
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| Conference Date | 2015/2/23(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
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| Paper Information | |
| Registration To | VLSI Design Technologies (VLD) |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | A cut-pattern reduction method for routing in Self-Aligned Double Patterning |
| Sub Title (in English) | |
| Keyword(1) | Self-Aligned Double Patterning (SADP) |
| Keyword(2) | Two-color base grid |
| Keyword(3) | Mask |
| Keyword(4) | Cut-Pattern |
| 1st Author's Name | Noriyuki TAKAHASHI |
| 1st Author's Affiliation | Department of Computer Science, Tokyo Institute of Technology() |
| 2nd Author's Name | Takeshi IHARA |
| 2nd Author's Affiliation | Department of Communications and Computer Engineering, Tokyo Institute of Technology |
| 3rd Author's Name | Atsushi TAKAHASHI |
| 3rd Author's Affiliation | Department of Communications and Computer Engineering, Tokyo Institute of Technology |
| Date | 2015-03-02 |
| Paper # | VLD2014-154 |
| Volume (vol) | vol.114 |
| Number (no) | 476 |
| Page | pp.pp.- |
| #Pages | 6 |
| Date of Issue | |