Presentation	2015-03-02 A Fast Lithographic Mask Correction Algorithm Ahmed Awad, Atsushi Takahashi,
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Abstract(in English)	As technology nodes downscaling into sub-16 nm regime, the industry relies heavily on Optical Proximity Correction (OPC) to improve mask pattern transfer fidelity and process window for optical micro-lithography. However, OPC computational time becomes a crucial factor since mask data have to be prepared in manner of hours to cover the huge industrial needs. Nevertheless, there is a trade-off between mask image accuracy and OPC simulation time. In this paper, we propose a new grid based algorithm to improve the accuracy of simulated mask image with the least number of convolutions during OPC process, which is proportional to OPC computational time. We analyze our algorithm and the observations we obtained on public benchmark released by IBM for ICCAD 2013 CAD contest.
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Paper #	VLD2014-153
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Committee	VLD
Conference Date	2015/2/23(1days)
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Registration To	VLSI Design Technologies (VLD)
Language	ENG
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Title (in English)	A Fast Lithographic Mask Correction Algorithm
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1st Author's Name	Ahmed Awad
1st Author's Affiliation	Department of Communications and Computer Engineering Tokyo Institute of Technology()
2nd Author's Name	Atsushi Takahashi
2nd Author's Affiliation	Department of Communications and Computer Engineering Tokyo Institute of Technology
Date	2015-03-02
Paper #	VLD2014-153
Volume (vol)	vol.114
Number (no)	476
Page	pp.pp.-
#Pages	6
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