Presentation 2014-12-12
Formation of nc-Si in SiOx by Soft X-ray Irradiation
Fumito KUSAKABE, Shota HIRANO, Akira HEYA, Naoto MATSUO, Kazuhiro KANDA, Takayasu MOTIZUKI, Shuji MIYAMOTO, Kazuyuki KOHAMA, Kazuhiro ITO,
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Abstract(in English) The low-temperature formation of nanocrystalline Si (nc-Si) in SiO_x is one of key technologies for the realization of high-quality solar cells. We proposed a low-temperature crystallization method by soft X-ray at BL07A in the synchrotron radiation facility, NewSUBARU. It is known that the crystallization temperature of amorphous Si (a-Si) film on SiO_2 substrate was reduced by about 100℃. The a-Si in SiO_x film was crystallized by atomic migration via electron excitation by soft X-ray irradiation at the photon energy near the core level of Si2p. The size of nc-Si prepared at 660℃ by soft X-ray irradiation was estimated to 16.8 nm from the peak position of Raman spectra. The nc-Si can be formed by soft X-ray irradiation at low temperature.
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Keyword(in English) Soft X-ray / nc-Si / Low-temperature crystallization / Raman scattering
Paper # EID2014-32,SDM2014-127
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Committee EID
Conference Date 2014/12/5(1days)
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Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Formation of nc-Si in SiOx by Soft X-ray Irradiation
Sub Title (in English)
Keyword(1) Soft X-ray
Keyword(2) nc-Si
Keyword(3) Low-temperature crystallization
Keyword(4) Raman scattering
1st Author's Name Fumito KUSAKABE
1st Author's Affiliation University of Hyogo()
2nd Author's Name Shota HIRANO
2nd Author's Affiliation University of Hyogo
3rd Author's Name Akira HEYA
3rd Author's Affiliation University of Hyogo
4th Author's Name Naoto MATSUO
4th Author's Affiliation University of Hyogo
5th Author's Name Kazuhiro KANDA
5th Author's Affiliation LASTI, University of Hyogo
6th Author's Name Takayasu MOTIZUKI
6th Author's Affiliation LASTI, University of Hyogo
7th Author's Name Shuji MIYAMOTO
7th Author's Affiliation LASTI, University of Hyogo
8th Author's Name Kazuyuki KOHAMA
8th Author's Affiliation Osaka University
9th Author's Name Kazuhiro ITO
9th Author's Affiliation Osaka University
Date 2014-12-12
Paper # EID2014-32,SDM2014-127
Volume (vol) vol.114
Number (no) 359
Page pp.pp.-
#Pages 4
Date of Issue