Presentation 2014-11-28
MOCVD growth and characterization of nearly-lattice-matched InAlN/AlGaN 2DEG heterostructures
Shu FUJITA, Makoto MIYOSHI, Takashi EGAWA,
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Abstract(in English) InAlN/AlGaN two-dimensional-electron gas (2DEG) heterostructures are expected to be able to show extremely high breakdown voltages as well as high 2DEG densities. In this study, we attempted to grow lattice-matched InAlN/AlGaN heterostructures by metalorganic chemical deposition (MOCVD) and to characterize them. Samples with the channel layers of Al_<0.1>Ga_<0.9>N of Al_<0.2>Ga_<0.8>N were successfully grown with nearly-lattice-matched structures. Their 2DEG densities were measured to be as high as 3×10^<13>/cm^2. It was confirmed that such high 2DEG densities are explained as a result of their high spontaneous polarization in InAlN barrier layers.
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Keyword(in English) InAlN/AlGaN heterostructures / MOCVD / two-dimensional-electron gas
Paper # ED2014-93,CPM2014-150,LQE2014-121
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Committee ED
Conference Date 2014/11/20(1days)
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Language JPN
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Title (in English) MOCVD growth and characterization of nearly-lattice-matched InAlN/AlGaN 2DEG heterostructures
Sub Title (in English)
Keyword(1) InAlN/AlGaN heterostructures
Keyword(2) MOCVD
Keyword(3) two-dimensional-electron gas
1st Author's Name Shu FUJITA
1st Author's Affiliation Research Center for Nano-Device and System, Nagoya Institute of Technology()
2nd Author's Name Makoto MIYOSHI
2nd Author's Affiliation Research Center for Nano-Device and System, Nagoya Institute of Technology
3rd Author's Name Takashi EGAWA
3rd Author's Affiliation Research Center for Nano-Device and System, Nagoya Institute of Technology
Date 2014-11-28
Paper # ED2014-93,CPM2014-150,LQE2014-121
Volume (vol) vol.114
Number (no) 336
Page pp.pp.-
#Pages 6
Date of Issue