Presentation 2014-07-17
Fabrication of ultra-high density nanodot arrays with high coercivity based on analysis of initial deposition process
Hiroki HAGIWARA, Siggi WODARZ, Tomohiro OTANI, Daiki NISHIIE, Giovanni ZANGARI, Takayuki HOMMA,
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Abstract(in English) We have attempted to fabricate ferromagnetic nanodot arrays for bit patterned media (BPM) by using electrochemical processes and lithography techniques. In this study, we fabricated hcp-Co_<80>Pt_<20> and Ll_0-FePt thin films and nanodot arrays onto hcp-Ru (002) / Si substrate and analyzed them. By using electron beam lithography with negative-type resist, electrodeposited Co-Pt nanodot arrays with 10 nm diameter and 25 nm pitch were uniformly fabricated. For controlling the initial deposition process, applied potential was changed during electrodeposition to surpress nucleation and promoting growth. As a result, the grain size was increased compared with the initial stage of the nucleation. The Fe-rich and Pt-rich multilayers were fabricated by pulse electrodeposition to enhance the phase transformation from fcc-Fe-Pt to Ll_0 Fe-Pt. By annealing at 650 ℃ and 500 ℃, the phase transformation from fcc-Fe-Pt to Ll_0 Fe-Pt was observed and Fe-Pt films with perpendicular coercivity of 13.4 kOe and 10.0 kOe. In addition, Fe-Pt nanodot arrays were successfully fabricated into the patterns formed using UV-nanoimprint lithography with such pulse electrodeposition.
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Keyword(in English) BPM / Electrodeposition / Co-Pt / Fe-Pt / Electron Beam Lithography / UV-Nanoimprint Lithography
Paper # MR2014-9
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Committee MR
Conference Date 2014/7/10(1days)
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Registration To Magnetic Recording (MR)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Fabrication of ultra-high density nanodot arrays with high coercivity based on analysis of initial deposition process
Sub Title (in English)
Keyword(1) BPM
Keyword(2) Electrodeposition
Keyword(3) Co-Pt
Keyword(4) Fe-Pt
Keyword(5) Electron Beam Lithography
Keyword(6) UV-Nanoimprint Lithography
1st Author's Name Hiroki HAGIWARA
1st Author's Affiliation Faculty of Science Engineering, Waseda University()
2nd Author's Name Siggi WODARZ
2nd Author's Affiliation Faculty of Science Engineering, Waseda University
3rd Author's Name Tomohiro OTANI
3rd Author's Affiliation Faculty of Science Engineering, Waseda University
4th Author's Name Daiki NISHIIE
4th Author's Affiliation Faculty of Science Engineering, Waseda University
5th Author's Name Giovanni ZANGARI
5th Author's Affiliation University of Virginia
6th Author's Name Takayuki HOMMA
6th Author's Affiliation Faculty of Science Engineering, Waseda University
Date 2014-07-17
Paper # MR2014-9
Volume (vol) vol.114
Number (no) 140
Page pp.pp.-
#Pages 4
Date of Issue