Presentation 2013-11-29
Control of nucleation for AlN growth on 6H-SiC substrate by low-pressure HVPE
Shin KITAGAWA, Hideto MIYAKE, Kazumasa HIRAMATSU,
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Abstract(in English) Aluminum nitride (AlN) has a direct band-gap energy of 6.2 eV, which is the largest band-gap energy among III-V semiconductors. Consequently, AlN has significant potential for many applications, such as high power ultra violet (UV) light emitting diodes, laser diodes, and UV detectors. 6H-SiC is a more suitable substrate than sapphire because of its better lattice match to AlN. However, AlN grown on 6H-SiC substrate has high dislocation density for 10^9-10^<10>cm^<-2>. There is a method of controlling nucleation and lateral growth using the three-dimensional (3D) and two-dimensional (2D) growth modes to reduce dislocation density. In this work, AlN were grown directly on 6H-SiC substrate by low-pressure HVPE. Then, we performed AlN growth on a trench-patterned 6H-SiC substrate and achieved reduction of threading dislocations density.
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Keyword(in English) Low-pressure HVPE / AlN / 6H-SiC / 3D-2D method
Paper # ED2013-81,CPM2013-140,LQE2013-116
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Committee CPM
Conference Date 2013/11/21(1days)
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Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Control of nucleation for AlN growth on 6H-SiC substrate by low-pressure HVPE
Sub Title (in English)
Keyword(1) Low-pressure HVPE
Keyword(2) AlN
Keyword(3) 6H-SiC
Keyword(4) 3D-2D method
1st Author's Name Shin KITAGAWA
1st Author's Affiliation Department of Electrical and Electronic Engineering, Mie University()
2nd Author's Name Hideto MIYAKE
2nd Author's Affiliation Department of Electrical and Electronic Engineering, Mie University
3rd Author's Name Kazumasa HIRAMATSU
3rd Author's Affiliation Department of Electrical and Electronic Engineering, Mie University
Date 2013-11-29
Paper # ED2013-81,CPM2013-140,LQE2013-116
Volume (vol) vol.113
Number (no) 330
Page pp.pp.-
#Pages 4
Date of Issue