Presentation 2013-11-29
Annealing in N_2-CO of AlN buffer layers on sapphire and high temperature growth of AlN layers by MOVPE
Gou NISHIO, Shuhei SUZUKI, Hideto MIYAKE, Kazumasa HIRAMATSU, Hiroyuki FUKUYAMA,
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Abstract(in English) AlN has attracted attention for applications in the deep ultraviolet region, because of its wide direct band-gap and excellent thermal and chemical stabilities. High-quality AlN layers were grown on thermally-annealed AlN buffer layer on sapphire by metal-organic vapor phase epitaxy (MOVPE). By annealing in a carbon-saturated N_2-CO gas mixture, the surface morphologies of AlN buffer layers were dramatically changed and the RMS values were improved. Additionally, the FWHM values of XRCs of the AlN buffer layers significantly decreased by annealing and the threading dislocation density of AlN grown on thermally-annealed AlN buffer layer at 1700℃ was less than 1.3×10^9cm^<-2>. These results indicate that the high-temperature annealing of AlN buffer layer is useful technique for reduction of dislocations in AlN grown on sapphire.
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Keyword(in English) annealing / N_2-CO / AlN / MOVPE / sapphire / buffer layer
Paper # ED2013-80,CPM2013-139,LQE2013-115
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Conference Information
Committee CPM
Conference Date 2013/11/21(1days)
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Registration To Component Parts and Materials (CPM)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Annealing in N_2-CO of AlN buffer layers on sapphire and high temperature growth of AlN layers by MOVPE
Sub Title (in English)
Keyword(1) annealing
Keyword(2) N_2-CO
Keyword(3) AlN
Keyword(4) MOVPE
Keyword(5) sapphire
Keyword(6) buffer layer
1st Author's Name Gou NISHIO
1st Author's Affiliation Department of Electrical and Electronic Engineering, Mie University()
2nd Author's Name Shuhei SUZUKI
2nd Author's Affiliation Department of Electrical and Electronic Engineering, Mie University
3rd Author's Name Hideto MIYAKE
3rd Author's Affiliation Department of Electrical and Electronic Engineering, Mie University
4th Author's Name Kazumasa HIRAMATSU
4th Author's Affiliation Department of Electrical and Electronic Engineering, Mie University
5th Author's Name Hiroyuki FUKUYAMA
5th Author's Affiliation Institute of Multidisciplinary Research for Advanced Materials (IMRAM), Tohoku University
Date 2013-11-29
Paper # ED2013-80,CPM2013-139,LQE2013-115
Volume (vol) vol.113
Number (no) 330
Page pp.pp.-
#Pages 4
Date of Issue