Presentation 2013-11-29
Growth of GaN with thin 3C-SiC buffer layer on Si(111) substrate
Masayoshi KATAGIRI, Kenta IZUMI, Hideto MIYAKE, Kazumasa HIRAMATSU, Hidehiko OKU, Hidetoshi ASAMURA, Keisuke KAWAMURA,
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Abstract(in English) Since GaN is desired for optical and electronic devices, therefore reduction of substrate cost is very important topic. As it is well known, GaN is difficult to be grown on Si because of large lattice mismatch (17%), difference of thermal expansion (33%) and melt-back reaction between Ga and Si. To overcome these problems, we have studied on epitaxy of high-quality GaN on Si with a 3C-SiC intermediate layer. In this study, we investigated effects of 3C-SiC intermediate layer thickness on surface morphology, crystalline quality and curvature of sample.
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Keyword(in English) Si(111) / 3C-SiC / GaN / MOVPE
Paper # ED2013-79,CPM2013-138,LQE2013-114
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Committee CPM
Conference Date 2013/11/21(1days)
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Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Growth of GaN with thin 3C-SiC buffer layer on Si(111) substrate
Sub Title (in English)
Keyword(1) Si(111)
Keyword(2) 3C-SiC
Keyword(3) GaN
Keyword(4) MOVPE
1st Author's Name Masayoshi KATAGIRI
1st Author's Affiliation Department of Electrical and Electronic Engineering, Mie University()
2nd Author's Name Kenta IZUMI
2nd Author's Affiliation Department of Electrical and Electronic Engineering, Mie University
3rd Author's Name Hideto MIYAKE
3rd Author's Affiliation Department of Electrical and Electronic Engineering, Mie University
4th Author's Name Kazumasa HIRAMATSU
4th Author's Affiliation Department of Electrical and Electronic Engineering, Mie University
5th Author's Name Hidehiko OKU
5th Author's Affiliation Air Water R&D Co., Ltd.
6th Author's Name Hidetoshi ASAMURA
6th Author's Affiliation Air Water R&D Co., Ltd.
7th Author's Name Keisuke KAWAMURA
7th Author's Affiliation Air Water R&D Co., Ltd.
Date 2013-11-29
Paper # ED2013-79,CPM2013-138,LQE2013-114
Volume (vol) vol.113
Number (no) 330
Page pp.pp.-
#Pages 4
Date of Issue