| Presentation | 2014-03-04 Advanced Model-Based Hotspot Fix Flow for Layout Optimization with Genetic Algorithm Shuhei SOTA, Taiga UNO, Masanari KAJIWARA, Chikaaki KODAMA, Hirotaka ICHIKAWA, Ryota ABURADA, Toshiya KOTANI, Kei NAKAGAWA, Tamaki SAITO, |
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| PDF Download Page |  PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | Under the low-k1 lithography process, many hotspots are generated and their reduction is an urgent issue for mass production. Several strategies for hotspots fix (HSF) were proposed so far. Among them, two major strategies are "rule-based HSF" and "pattern matching-based HSF". The former is a simple strategy of expanding the width of narrow patterns and spaces based on pre-determined rule to remove hotspots. However, hotspots unable to remove by this strategy are increasing in recent 32nm and 28nm node. On the other hand, the latter is more effective than the former. This HSF can remove hotspots by replacing the pattern with the corresponding fixed pattern if both patterns are registered in the library. When they are not registered, it is understood that hotspots cannot be removed. Therefore, we propose a new model-based HSF strategy. Our strategy finds minimum width of pattern and minimum space between patterns and tries to remove hotspots by moving edges of the patterns. Genetic algorithm determines appropriately which edges to move and how long. The experimental results show the effectiveness of our strategy. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | Lithography / Hotspot / HSF / Genetic algorithm / Model-based HSF |
| Paper # | VLD2013-148 |
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| Conference Information | |
| Committee | VLD |
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| Conference Date | 2014/2/24(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
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| Paper Information | |
| Registration To | VLSI Design Technologies (VLD) |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Advanced Model-Based Hotspot Fix Flow for Layout Optimization with Genetic Algorithm |
| Sub Title (in English) | |
| Keyword(1) | Lithography |
| Keyword(2) | Hotspot |
| Keyword(3) | HSF |
| Keyword(4) | Genetic algorithm |
| Keyword(5) | Model-based HSF |
| 1st Author's Name | Shuhei SOTA |
| 1st Author's Affiliation | Toshiba Microelectronics Corporation() |
| 2nd Author's Name | Taiga UNO |
| 2nd Author's Affiliation | Toshiba Corporation Semiconductor & Storage Company |
| 3rd Author's Name | Masanari KAJIWARA |
| 3rd Author's Affiliation | Toshiba Corporation Semiconductor & Storage Company |
| 4th Author's Name | Chikaaki KODAMA |
| 4th Author's Affiliation | Toshiba Corporation Semiconductor & Storage Company |
| 5th Author's Name | Hirotaka ICHIKAWA |
| 5th Author's Affiliation | Toshiba Microelectronics Corporation |
| 6th Author's Name | Ryota ABURADA |
| 6th Author's Affiliation | Toshiba Corporation Semiconductor & Storage Company |
| 7th Author's Name | Toshiya KOTANI |
| 7th Author's Affiliation | Toshiba Corporation Semiconductor & Storage Company |
| 8th Author's Name | Kei NAKAGAWA |
| 8th Author's Affiliation | Toshiba Microelectronics Corporation |
| 9th Author's Name | Tamaki SAITO |
| 9th Author's Affiliation | Toshiba Microelectronics Corporation |
| Date | 2014-03-04 |
| Paper # | VLD2013-148 |
| Volume (vol) | vol.113 |
| Number (no) | 454 |
| Page | pp.pp.- |
| #Pages | 78 |
| Date of Issue | |