Presentation | 2013-06-21 Silicon photonics devices on 300mm wafer fabricated by using ArF immersion lithography Tomohiro KITA, Yuichiro TANUSHI, Masaki NARA, Syu HIRANO, Munehiro TOYAMA, Miyoshi SEKI, Keiji KOSHINO, Nobuyuki YOKOYAMA, Minoru OHTSUKA, Akinobu SUGIYAMA, Eiichi ISHITSUKA, Tsukuru SANO, Tsuyoshi HORIKAWA, Hirohito YAMADA, |
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Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | We have investigated optical characteristics of Si photonics devices formed on 300 mm SOI wafers by using ArF immersion lithography process. The measurement results were in good agreement with the calculated results for designed structure and the process accuracy for silicon photonics devices were verified. |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | Silicon Photonics / Directional Coupler / Ring resonator |
Paper # | OPE2013-7,LQE2013-17 |
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Committee | OPE |
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Conference Date | 2013/6/14(1days) |
Place (in Japanese) | (See Japanese page) |
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Topics (in Japanese) | (See Japanese page) |
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Paper Information | |
Registration To | Optoelectronics (OPE) |
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Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | Silicon photonics devices on 300mm wafer fabricated by using ArF immersion lithography |
Sub Title (in English) | |
Keyword(1) | Silicon Photonics |
Keyword(2) | Directional Coupler |
Keyword(3) | Ring resonator |
1st Author's Name | Tomohiro KITA |
1st Author's Affiliation | Department of Communication Engineering, Tohoku University() |
2nd Author's Name | Yuichiro TANUSHI |
2nd Author's Affiliation | Department of Communication Engineering, Tohoku University |
3rd Author's Name | Masaki NARA |
3rd Author's Affiliation | Department of Communication Engineering, Tohoku University |
4th Author's Name | Syu HIRANO |
4th Author's Affiliation | Department of Communication Engineering, Tohoku University |
5th Author's Name | Munehiro TOYAMA |
5th Author's Affiliation | National Institute of Advanced Industrial Science and Technology (AIST) |
6th Author's Name | Miyoshi SEKI |
6th Author's Affiliation | National Institute of Advanced Industrial Science and Technology (AIST) |
7th Author's Name | Keiji KOSHINO |
7th Author's Affiliation | National Institute of Advanced Industrial Science and Technology (AIST) |
8th Author's Name | Nobuyuki YOKOYAMA |
8th Author's Affiliation | National Institute of Advanced Industrial Science and Technology (AIST) |
9th Author's Name | Minoru OHTSUKA |
9th Author's Affiliation | National Institute of Advanced Industrial Science and Technology (AIST) |
10th Author's Name | Akinobu SUGIYAMA |
10th Author's Affiliation | National Institute of Advanced Industrial Science and Technology (AIST) |
11th Author's Name | Eiichi ISHITSUKA |
11th Author's Affiliation | National Institute of Advanced Industrial Science and Technology (AIST) |
12th Author's Name | Tsukuru SANO |
12th Author's Affiliation | National Institute of Advanced Industrial Science and Technology (AIST) |
13th Author's Name | Tsuyoshi HORIKAWA |
13th Author's Affiliation | National Institute of Advanced Industrial Science and Technology (AIST) |
14th Author's Name | Hirohito YAMADA |
14th Author's Affiliation | Department of Communication Engineering, Tohoku University |
Date | 2013-06-21 |
Paper # | OPE2013-7,LQE2013-17 |
Volume (vol) | vol.113 |
Number (no) | 99 |
Page | pp.pp.- |
#Pages | 5 |
Date of Issue |