Presentation 2013-06-21
Silicon photonics devices on 300mm wafer fabricated by using ArF immersion lithography
Tomohiro KITA, Yuichiro TANUSHI, Masaki NARA, Syu HIRANO, Munehiro TOYAMA, Miyoshi SEKI, Keiji KOSHINO, Nobuyuki YOKOYAMA, Minoru OHTSUKA, Akinobu SUGIYAMA, Eiichi ISHITSUKA, Tsukuru SANO, Tsuyoshi HORIKAWA, Hirohito YAMADA,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) We have investigated optical characteristics of Si photonics devices formed on 300 mm SOI wafers by using ArF immersion lithography process. The measurement results were in good agreement with the calculated results for designed structure and the process accuracy for silicon photonics devices were verified.
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Keyword(in English) Silicon Photonics / Directional Coupler / Ring resonator
Paper # OPE2013-7,LQE2013-17
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Conference Information
Committee LQE
Conference Date 2013/6/14(1days)
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Registration To Lasers and Quantum Electronics (LQE)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Silicon photonics devices on 300mm wafer fabricated by using ArF immersion lithography
Sub Title (in English)
Keyword(1) Silicon Photonics
Keyword(2) Directional Coupler
Keyword(3) Ring resonator
1st Author's Name Tomohiro KITA
1st Author's Affiliation Department of Communication Engineering, Tohoku University()
2nd Author's Name Yuichiro TANUSHI
2nd Author's Affiliation Department of Communication Engineering, Tohoku University
3rd Author's Name Masaki NARA
3rd Author's Affiliation Department of Communication Engineering, Tohoku University
4th Author's Name Syu HIRANO
4th Author's Affiliation Department of Communication Engineering, Tohoku University
5th Author's Name Munehiro TOYAMA
5th Author's Affiliation National Institute of Advanced Industrial Science and Technology (AIST)
6th Author's Name Miyoshi SEKI
6th Author's Affiliation National Institute of Advanced Industrial Science and Technology (AIST)
7th Author's Name Keiji KOSHINO
7th Author's Affiliation National Institute of Advanced Industrial Science and Technology (AIST)
8th Author's Name Nobuyuki YOKOYAMA
8th Author's Affiliation National Institute of Advanced Industrial Science and Technology (AIST)
9th Author's Name Minoru OHTSUKA
9th Author's Affiliation National Institute of Advanced Industrial Science and Technology (AIST)
10th Author's Name Akinobu SUGIYAMA
10th Author's Affiliation National Institute of Advanced Industrial Science and Technology (AIST)
11th Author's Name Eiichi ISHITSUKA
11th Author's Affiliation National Institute of Advanced Industrial Science and Technology (AIST)
12th Author's Name Tsukuru SANO
12th Author's Affiliation National Institute of Advanced Industrial Science and Technology (AIST)
13th Author's Name Tsuyoshi HORIKAWA
13th Author's Affiliation National Institute of Advanced Industrial Science and Technology (AIST)
14th Author's Name Hirohito YAMADA
14th Author's Affiliation Department of Communication Engineering, Tohoku University
Date 2013-06-21
Paper # OPE2013-7,LQE2013-17
Volume (vol) vol.113
Number (no) 100
Page pp.pp.-
#Pages 5
Date of Issue