Presentation 2013-07-18
Electrostatic Analysis of Effective Permittivity for Microstructure
Takuichi HIRANO, Jiro HIROKAWA, Makoto ANDO,
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Abstract(in English) The authors have proposed evaluation technique of effective material property for dummy metal fills, which is inevitable to use in CMOS process. The proposed methods were (1) method that analyze eigenmode of a unit-cell by assuming wave propagation problem, and (2) method that assume capacitor and inductor model for a unit-cell to extract effective material property. This report presents electrostatic analysis of effective permittivity for dummy metal fills used in CMOS chips in order to verify the proposed methods in the past and to propose quick evaluation method. The effective permittivity agreed very well with those calculated by proposed methods in the past.
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Keyword(in English) Microstructure / Dummy metal fills / CMOS / Electrostatic analysis / Effective permittivity / Laplace equation / Extraction
Paper # MW2013-50,OPE2013-19,EST2013-14,MWP2013-9
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Committee OPE
Conference Date 2013/7/11(1days)
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Registration To Optoelectronics (OPE)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Electrostatic Analysis of Effective Permittivity for Microstructure
Sub Title (in English)
Keyword(1) Microstructure
Keyword(2) Dummy metal fills
Keyword(3) CMOS
Keyword(4) Electrostatic analysis
Keyword(5) Effective permittivity
Keyword(6) Laplace equation
Keyword(7) Extraction
1st Author's Name Takuichi HIRANO
1st Author's Affiliation Graduate School of Science and Engineering, Tokyo Institute of Technology()
2nd Author's Name Jiro HIROKAWA
2nd Author's Affiliation Graduate School of Science and Engineering, Tokyo Institute of Technology
3rd Author's Name Makoto ANDO
3rd Author's Affiliation Graduate School of Science and Engineering, Tokyo Institute of Technology
Date 2013-07-18
Paper # MW2013-50,OPE2013-19,EST2013-14,MWP2013-9
Volume (vol) vol.113
Number (no) 142
Page pp.pp.-
#Pages 6
Date of Issue