Presentation 2013-05-17
Electron-tunneling operation of single-dopant-atom transistors at elevated temperature : Toward room temperature operation
Daniel MORARU, Earfan HAMID, Arup SAMANTA, Le The ANH, Takeshi MIZUNO, Hiroshi MIZUTA, Michiharu TABE,
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Abstract(in English) Single-dopant transistors work based on single-electron tunneling via an individual dopant atom located in a nanoscale channel. Until recently, single-dopant transistors have been studied only at low temperatures (<15 K) in order to clarify the fundamental properties of dopants in nano-channels. At higher temperatures, tunneling via dopants may be smeared out because of thermally-activated carriers. However, it is important to design single-electron tunneling single-dopant devices that work even at elevated temperatures. In this work, we show that the tunnel barrier can be increased by special design of the channel shape to enhance the dielectric confinement effect. This allows the observation of tunneling current peaks even at temperatures of about 100 K, much higher than reported so far. Ab initio simulations offer further insights into the basic properties of individual dopants in extremely downscaled channels. The results suggest the possibility of realizing single-dopant transistors operating by tunneling even at room temperature.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) Dielectric confinement effect / single dopant / field-effect transistor / high temperature / single-electron tunneling
Paper # ED2013-28,CPM2013-13,SDM2013-35
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Conference Information
Committee CPM
Conference Date 2013/5/9(1days)
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Language ENG
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Electron-tunneling operation of single-dopant-atom transistors at elevated temperature : Toward room temperature operation
Sub Title (in English)
Keyword(1) Dielectric confinement effect
Keyword(2) single dopant
Keyword(3) field-effect transistor
Keyword(4) high temperature
Keyword(5) single-electron tunneling
1st Author's Name Daniel MORARU
1st Author's Affiliation Research Institute of Electronics, Shizuoka University()
2nd Author's Name Earfan HAMID
2nd Author's Affiliation Research Institute of Electronics, Shizuoka University
3rd Author's Name Arup SAMANTA
3rd Author's Affiliation Research Institute of Electronics, Shizuoka University
4th Author's Name Le The ANH
4th Author's Affiliation School of Materials Science, Japan Advanced Institute of Science and Technology
5th Author's Name Takeshi MIZUNO
5th Author's Affiliation Research Institute of Electronics, Shizuoka University
6th Author's Name Hiroshi MIZUTA
6th Author's Affiliation School of Materials Science, Japan Advanced Institute of Science and Technology:Nano Group, ECS, Faculty of Physical and Applied Sciences, University of Southampton
7th Author's Name Michiharu TABE
7th Author's Affiliation Research Institute of Electronics, Shizuoka University
Date 2013-05-17
Paper # ED2013-28,CPM2013-13,SDM2013-35
Volume (vol) vol.113
Number (no) 40
Page pp.pp.-
#Pages 6
Date of Issue